| 自动化蚀刻控制下的可重复性 |
| |
| 引用本文： | 赵水林,葛晓景.自动化蚀刻控制下的可重复性[J].半导体技术,2004,29(5):31-34. |
| |
| 作者姓名： | 赵水林 葛晓景 |
| |
| 作者单位： | 上海先进半导体制造有限公司,FSI international,上海,200233 |
| |
| 摘 要： | 以氟化氢为基础的溶液被广泛地用在扩散前清洗工艺中的二氧化硅清洗与蚀刻中.为降低不同批次之间工艺效果的差别,也就是增加批次与批次之间工艺效果的可重复性,更好地控制氧化物地腐蚀显得尤为重要.自动化的蚀刻控制体系弥补了在线的化学品浓度与反应温度的偏差而达到了精确的蚀刻目标.
|
| 关 键 词： | 可重复性 清洗 腐蚀 repeatability cleaning etching 自动化 蚀刻 控制 可重复性 control automated repeatability Automated concentration temperature variations present manufacturing process results target essential different especially batch Better oxide |
Better repeatability through automated etch control |
| |
| Abstract.Better repeatability through automated etch control[J].Semiconductor Technology,2004,29(5):31-34. |
| |
| Authors: | Abstract |
| |
| Affiliation: | Advanced Semiconductor Manufacturing Corporation of Shang hai;FSI international |
| |
| Abstract: | HF-based solution is widely used for cleaning and wet etching SiO2 in pre-diffusion cleanprocess. Better oxide loss control, especially batch to batch repeatability, is essential to reducing variationamong different batches. Automated etch control compensates for the concentration and temperature variationspresent in any manufacturing process and provides results that hit the etch target. |
| |
| Keywords: | repeatability cleaning etching |
| 本文献已被 CNKI 维普 万方数据 等数据库收录！ |
