| 脉冲准分子激光PZT薄膜的制备 |
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| 引用本文： | 陈逸清,郑立荣,林成鲁,邹世昌.脉冲准分子激光PZT薄膜的制备[J].中国激光,1994,21(8):631-634. |
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| 作者姓名： | 陈逸清 郑立荣 林成鲁 邹世昌 |
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| 作者单位： | 中国科学院上海冶金所信息功能材料国家重点实验室 |
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| 摘 要： | 本实验采用脉冲准分子激光沉积（ＰＬＤ）法，在１９３ｎｍ波长，５Ｈｚ频率，４Ｊ／ｃｍ２能量密度条件下，分别在Ｓｉ（１００）和ＳｉＯ２／Ｓｉ衬底上成功地沉积Ｐｂ（Ｚｒ，Ｔｉ）Ｏ３（ＰＺＴ）薄膜，并在不同的条件下对ＰＺＴ薄膜进行退火处理。用ＸＲＤ，ＲＢＳ，ＡＳＲ等方法分别测量了薄膜的结构、组份和厚度。
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| 关 键 词： | PZT，脉冲激光沉积（PLD），铁电薄膜 |
| 收稿时间： | 1993/12/7 |
Lead Zirconate Titanate Thin Films Produced by Pulsed Excimer Laser Deposition |
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| Chen Yiqing,Zheng Lirong,Lin Chenglu,Zou Shichang.Lead Zirconate Titanate Thin Films Produced by Pulsed Excimer Laser Deposition[J].Chinese Journal of Lasers,1994,21(8):631-634. |
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| Authors: | Chen Yiqing Zheng Lirong Lin Chenglu Zou Shichang |
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| Abstract: | It is a new technology to combine the laser with the thin film deposition. Lead zirconate titanate (PZT) films were successfully deposited on the Si(100) and SiO2/Si substrates by pulsed eximer laser (λ=193 nm) deposition at 5 Hz, 4 J/cm2 and then annealed by RTA at various conditions.The structure, composition and thickness of the films were measured by XRD, RBS and ASR respectively. |
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| Keywords: | PZT pulsed laser deposition(PLD) ferroelectric thin film |
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