| 原子光刻用亚稳态氖原子束源的研究 |
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| 引用本文： | 霍芸生,蔡惟泉,曾庆林,鄢和明,王育竹.原子光刻用亚稳态氖原子束源的研究[J].中国激光,2002,29(1):40-42. |
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| 作者姓名： | 霍芸生 蔡惟泉 曾庆林 鄢和明 王育竹 |
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| 作者单位： | 中国科学院上海光学精密机械研究所量子光学开放实验室,上海,201800 |
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| 基金项目： | 国家自然科学基金 (No .197740 6 0 )资助项目 |
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| 摘 要： | 研制了一台用于原子光刻的亚稳态氖原子束源 ,其束流强度可达 3 3× 10 14 atoms/s·Sr.。研究了束流强度的变化规律 ,并对其机理进行了探讨。
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| 关 键 词： | 惰性气体 亚稳态 原子束 |
| 收稿时间： | 2000/11/23 |
Study on Metastable Neon Beam Source Used for Atom Lithography |
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| HUO Yun-sheng,CAI Wei-quan,ZENG Qing-lin,YAN He-ming,WANG Yu-zhu.Study on Metastable Neon Beam Source Used for Atom Lithography[J].Chinese Journal of Lasers,2002,29(1):40-42. |
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| Authors: | HUO Yun-sheng CAI Wei-quan ZENG Qing-lin YAN He-ming WANG Yu-zhu |
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| Abstract: | A neon metastable beam source was built up, from which Neon metastable beam of the intensity of 3.3×10 14 atoms/s·Sr. was generated. The characteristics of the metastable Neon beam were studied, and the corresponding mechanisms are discussed. |
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| Keywords: | inert gas metastable state atomic beam |
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