|
|||||
|
|
| CVD金刚石（膜）制备技术及应用进展 | |
| 引用本文： | 马国欣,向鹏,邱胜宝,邬纪泽.CVD金刚石（膜）制备技术及应用进展[J].真空电子技术,2009(5):5-11. |
| 作者姓名： | 马国欣 向鹏 邱胜宝 邬纪泽 |
| 作者单位： | 1. 华南理工大学电子与信息学院,广东,广州,510641;广州中国科学院工业技术研究院,广东,广州,511458 2. 广州中国科学院工业技术研究院,广东,广州,511458 3. 广州中国科学院工业技术研究院,广东,广州,511458;中国科学院成都光电技术研究所,四川成都,610209 |
| 摘 要： | 化学气相沉积（CVD）方法是金刚石（膜）制备的主流技术，经过多年的发展，已从最初的微米金刚石膜发展到纳米金刚石膜，至目前高质量的单晶金刚石，应用领域不断扩展。除了工业和民用领域外，纳米金刚石膜在MEMS／NEMs、生物医学的应用进展引起业界关注，其中大尺寸单晶金刚石的制备是推动这些应用的关键。本文分析了MPCVD金刚石成膜特点，讨论了现阶段CVD金刚石膜商业化推广应用的制约因素，展望了今后金刚石膜的发展前景。 |
| 关 键 词： | CVD 金刚石 薄膜 应用 |
Development of Preparative Technique and Application of Chemical Vapor Deposition Diamond(Film) |
|
| MA Guo-xin,XIANG Peng,QIU Sheng-bao,WU Ji-zhe.Development of Preparative Technique and Application of Chemical Vapor Deposition Diamond(Film)[J].Vacuum Electronics,2009(5):5-11. | |
| Authors: | MA Guo-xin XIANG Peng QIU Sheng-bao WU Ji-zhe |
| Affiliation: | MA Guo-xin , XIANG Peng, QIU Sheng-bao ,WU Ji-zhe (1. School of Electronic and Information Engineering, South China University of Technology, Guangzhou 510641, China; 2. Institute of Industry Technology, Guangzhou ＆ Chinese Academy of Sciences, Guangzhou 511458, China; 3. Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209 ,China) |
| Abstract: | Chemical Vapor Deposition （CVD） is now the main way to prepare diamond （film）. After decades of development, from micro- to nano-crystalline diamond films and single crystal diamond with most outstanding properties, applications of diamond （film） continue to grow. Besides industrial and commercial applications, nano-crystalline diamond films in MEMS/NEMS and bio-medical applications draws people＇s attention. Preparation of large-size single-crystal diamond is the key to promote these applications. This paper analyses characteristics of Microwave Plasma CVD（MPCVD）, discusses the problems in com- mercialization of CVD diamond （film） application, outlooks the future of diamond film applications. |
| Keywords: | CVD |
| 本文献已被 维普 万方数据 等数据库收录！ | |
