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NANOSCALE STRAINED-Si MOSFET PHYSICS AND MODELING APPROACHES:A REVIEW
作者姓名:Amit Chaudhry  J. N. Roy  Garima Joshi
摘    要:In this paper, an attempt has been made to give a detailed review of strained silicon technology. Various device models have been studied in this paper that consider the effect of strain on the devices and their comparisons have been drawn. A review of some modeling issues in strained silicon technology has also been outlined. The review indicates that this technology is very much required in nanoscale MOSFETs due to its several potential benefits and there is a strong need of an analytical model which describes the complete physics of the strain technology.

关 键 词:应变硅技术  MOSFET  建模方法  纳米级  物理  展望  设备模型  应变效应
修稿时间:5/9/2010 3:49:17 AM

Nanoscale strained-Si MOSFET physics and modeling approaches: a review
Amit Chaudhry,J. N. Roy,Garima Joshi.NANOSCALE STRAINED-Si MOSFET PHYSICS AND MODELING APPROACHES:A REVIEW[J].Chinese Journal of Semiconductors,2010,31(10):104001-5.
Authors:Amit Chaudhry  J N Roy and Garima Joshi
Affiliation:University Institute of Engineering and Technology, Panjab University, Chandigarh 91160047, India;Solar Semiconductor Private Limited, Hyderabad 91510001, India;University Institute of Engineering and Technology, Panjab University, Chandigarh 91160047, India
Abstract:An attempt has been made to give a detailed review of strained silicon technology. Various device models have been studied that consider the effect of strain on the devices, and comparisons have been drawn. A review of some modeling issues in strained silicon technology has also been outlined. The review indicates that this technology is very much required in nanoscale MOSFETs due to its several potential benefits, and there is a strong need for an analytical model which describes the complete physics of the strain technology.
Keywords:mobility  SiGe  strained-Si  technology CAD
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