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Enhancement of phosphorus solubility in ZnO by thermal annealing
作者姓名:K. Mahmoo  N. Amin  A. Ali  M. Ajaz un Nabi  M. Imran Arsh  M. Zafar  M. Asghar
基金项目:Authors are thankful to the Higher Education Commission (HEC) of Pakistan for the financial assistance under project # IPFP/HRD/HEC/2014/2016
摘    要:We have demonstrated the effect of annealing temperature on the diffusion density of phosphors in zinc oxide. The P-dopant P430 was sprayed on ZnO pellets and annealed at different temperatures from 500 to 1000℃ with a step of 100℃ for one hour using a programmable furnace. The concentration of P was controlled by varying the annealing temperature and the maximum solubility of P(3% At) was achieved at annealing 800℃ determined by energy dispersive X-ray diffraction(EDX) measurements. X-ray diffraction(XRD) confirmed the hexagonal structure of ZnO and showed that the growth direction was along the c-axis. We observed a maximum up shift in the(002) plane at an annealing temperature of 800℃, suggesting that P atoms replaced Zn atoms in the structure which results in the reduction of the lattice constant. Room temperature photoluminescence(PL) spectrum consists of a peak at 3.28 eV and related to band edge emission, but samples annealed at 800 and 900℃ have an additional donor acceptor pair peak at 3.2 eV. Hall effect measurements confirmed the p-type conductivity of the sample annealed at 800℃.

关 键 词:ZnO  P-dopant  EDX  XRD  PL
收稿时间:4/8/2015 12:00:00 AM

Enhancement of phosphors-solubility in ZnO by thermal annealing
K. Mahmoo,N. Amin,A. Ali,M. Ajaz un Nabi,M. Imran Arsh,M. Zafar,M. Asghar.Enhancement of phosphorus solubility in ZnO by thermal annealing[J].Chinese Journal of Semiconductors,2015,36(12):123001-4.
Authors:K Mahmoo  N Amin  A Ali  M Ajaz un Nabi  M Imran Arsha  M Zafar and M Asghar
Affiliation:1. Department of Physics,GC University Faisalabad,Pakistan;2. Department of Physics,Islamia University of Bahawalpur,Pakistan
Abstract:
Keywords:ZnO  P-dopant  EDX  XRD  PL
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