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采用混合晶向实现PMOSFET迁移率提升了150%
引用本文:唐昭焕,谭开洲,崔伟,张静,钟怡,徐世六,郝跃,张鹤鸣,胡辉勇,张正璠,胡刚毅.采用混合晶向实现PMOSFET迁移率提升了150%[J].半导体学报,2012,33(6):064002-4.
作者姓名:唐昭焕  谭开洲  崔伟  张静  钟怡  徐世六  郝跃  张鹤鸣  胡辉勇  张正璠  胡刚毅
作者单位:Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China
基金项目:国家基础研究重大项目基金(No.61398);
摘    要:本文提出了一种基于混合晶向硅材料的高性能PMOSFET 器件。采用硅玻键合、化学机械抛光、硅刻蚀和非选择性外延等方法,成功制作了集成有(100)和(110)晶向的混合晶向硅片。基于这种混合晶向材料,成功研制了沟道宽长比为50:8 的PMOSFET器件,器件测试结果表明:制作在(110)晶向上的PMOSFET 器件在低场条件下,电流驱动能力提高了50.7%,最大迁移率增加了150%,是当前见于报道的PMOSFET迁移率提升指标较高的一颗器件。

关 键 词:混合晶向  非选择性外延  载流子迁移率  (110)晶向  PMOSFET  化学机械抛光
修稿时间:2/14/2012 8:19:03 PM

A 150% enhancement of PMOSFET mobility using hybrid orientation
Tang Zhaohuan,Tan Kaizhou,Cui Wei,Zhang Jing,Zhong Yi,Xu Shiliu,Hao Yue,Zhang Heming,Hu Huiyong,Zhang Zhengfan and Hu Gangyi.A 150% enhancement of PMOSFET mobility using hybrid orientation[J].Chinese Journal of Semiconductors,2012,33(6):064002-4.
Authors:Tang Zhaohuan  Tan Kaizhou  Cui Wei  Zhang Jing  Zhong Yi  Xu Shiliu  Hao Yue  Zhang Heming  Hu Huiyong  Zhang Zhengfan and Hu Gangyi
Affiliation:Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Key Laboratory of the Ministry of Education for Wide-Band Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China;Science and Technology on Analog Integrated Circuit Laboratory, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China;Sichuan Institute of Solid-State Circuits, China Electronics Technology Group Corp, Chongqing 400060, China
Abstract:
Keywords:hybrid orientation  non-selective expitaxy  carrier mobility  (110) crystal orientation  PMOSFET  chemical mechanical polishing
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