| Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography |
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| 作者姓名： | Wu Zhigang Zhang Weigang Wang Zhi Kai Guiyun Yuan Shuzhong Dong Xiaoyi Utaka K Wada Y |
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| 作者单位： | 南开大学现代光学研究所，天津 300071;早稻田大学理工学部，东京 169-8555，日本;南开大学现代光学研究所，天津 300071;南开大学现代光学研究所，天津 300072;南开大学现代光学研究所，天津 300073;南开大学现代光学研究所，天津 300074;南开大学现代光学研究所，天津 300075;早稻田大学理工学部，东京 169-8555，日本;早稻田大学理工学部，东京 169-8555，日本 |
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| 摘 要： | 报道了一种用电子束曝光的方法在绝缘体上硅的脊状光波导上制做布拉格光栅的技术.考虑到实际的光子学集成的应用,讨论了这个带有布拉格光栅的脊状光波导的优化设计,给出了该布拉格光栅的测试和理论模拟结果.通过薄化绝缘体上硅的波导层的厚度和光栅的深腐蚀加工,获得了高达30cm-1的光栅耦合系数.
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| 关 键 词： | 集成光学 布拉格光栅 绝缘体上硅 脊状光波导 integrated optics Bragg grating silicon-on-insulator rib waveguide 电子束曝光 方法 优化设计 绝缘体 波导层 布拉格 光栅耦合系数 制作 评价 Lithography Waveguides Gratings Bragg grating Evaluation large coupling coefficient thinning device layer etching |
| 文章编号： | 0253-4177(2006)08-1347-04 |
| 收稿时间： | 01 4 2006 12:00AM |
| 修稿时间： | 03 22 2006 12:00AM |
Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography |
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| Wu Zhigang,Zhang Weigang,Wang Zhi,Kai Guiyun,Yuan Shuzhong,Dong Xiaoyi,Utaka K,Wada Y.Fabrication and Evaluation of Bragg Gratings on Optimally Designed Silicon-on-Insulator Rib Waveguides Using Electron-Beam Lithography[J].Chinese Journal of Semiconductors,2006,27(8):1347-1350. |
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| Authors: | Wu Zhigang Zhang Weigang Wang Zhi Kai Guiyun Yuan Shuzhong Dong Xiaoyi Utaka K and Wada Y |
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| Affiliation: | Institute of Modern Optics,Nankai University,Tianjin 300071,China;School of Science and Engineering,WASEDA University,Tokyo 169-8555,Japan;Institute of Modern Optics,Nankai University,Tianjin 300071,China;Institute of Modern Optics,Nankai University,Tianjin 300071,China;Institute of Modern Optics,Nankai University,Tianjin 300071,China;Institute of Modern Optics,Nankai University,Tianjin 300071,China;Institute of Modern Optics,Nankai University,Tianjin 300071,China;School of Science and Engineering,WASEDA University,Tokyo 169-8555,Japan;School of Science and Engineering,WASEDA University,Tokyo 169-8555,Japan |
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| Abstract: | The fabrication of Bragg gratings on silicon-on-insulator (SOI) rib waveguides using electron-beam lithography is presented.The grating waveguide is optimally designed for actual photonic integration.Experimental and theoretical evaluations of the Bragg grating are demonstrated.By thinning the SOI device layer and deeply etching the Bragg grating,a large grating coupling coefficient of 30cm-1 is obtained. |
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| Keywords: | integrated optics Bragg grating silicon-on-insulator rib waveguide |
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