首页 | 官方网站   微博 | 高级检索  
     


Toluene decomposition performance and NOx by-product formation during a DBD-catalyst process
Authors:Yufang Guo  Xiaobin Liao  Mingli Fu  Haibao Huang  Daiqi Ye
Affiliation:1. College of Environmental Science and Engineering, Guangzhou University, Guangzhou 510006, China ;Guangdong Provincial Key Laboratory of Environmental Pollution Control and Remediation Technology(Sun Yat-sen University),Guangzhou 510275, China ;Guangdong Provincial Key Laboratory of Atmospheric Environment and Pollution Control, Guangzhou 510006, China
2. College of Environmental Science and Engineering, South China University of Technology, Guangzhou 510006, China
3. College of Environmental Science and Engineering, Sun Yat-Sen University, Guangzhou 510275, China
Abstract:Characteristics of toluene decomposition and formation of nitrogen oxide(NOx) by-products were investigated in a dielectric barrier discharge(DBD) reactor with/without catalyst at room temperature and atmospheric pressure. Four kinds of metal oxides, i.e., manganese oxide(Mn Ox), iron oxide(Fe Ox), cobalt oxide(Co Ox) and copper oxide(Cu O), supported on Al2O3/nickel foam, were used as catalysts. It was found that introducing catalysts could improve toluene removal efficiency, promote decomposition of by-product ozone and enhance CO2 selectivity. In addition, NOx was suppressed with the decrease of specific energy density(SED) and the increase of humidity, gas flow rate and toluene concentration, or catalyst introduction. Among the four kinds of catalysts, the Cu O catalyst showed the best performance in NOx suppression. The Mn Ox catalyst exhibited the lowest concentration of O3 and highest CO2 selectivity but the highest concentration of NOx. A possible pathway for NOx production in DBD was discussed. The contributions of oxygen active species and hydroxyl radicals are dominant in NOx suppression.
Keywords:Dielectric barrier discharge  Nitrogen oxides  Catalyst  Toluene
本文献已被 CNKI 万方数据 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号