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在辉光放电电解等离子体处理的铜基表面上接枝硬脂酸制备超疏水材料
引用本文:高锦章,李亚萍,李岩,刘宏伟,陶丽红.在辉光放电电解等离子体处理的铜基表面上接枝硬脂酸制备超疏水材料[J].西北师范大学学报,2012(2):42-46,56.
作者姓名:高锦章  李亚萍  李岩  刘宏伟  陶丽红
作者单位:西北师范大学化学化工学院
基金项目:教育部重点科技基金资助项目(00250);甘肃省自然科学基金资助项目(3ZS041-A25-028;096RJ2A120);西北师范大学科技创新工程资助项目(NWNU-KJCXGC-01)
摘    要:利用辉光放电电解等离子体技术对铜基底表面进行活化,再经硬脂酸修饰,得到铜基底超疏水性材料.考查了Na2SO4浓度、放电电压、放电时间、硬脂酸-甲醇溶液浓度、接枝时间以及接枝温度对超疏水表面性能的影响.用接触角仪、X射线衍射(XRD)、X射线光电子能谱(XPS)、红外光谱(FTIR)对铜表面的润湿性、表面元素组成及结构进行了表征和分析.结果表明,经修饰的铜基底表面具有良好的疏水性,接触角高达155.30°,滚动角小于5°,且稳定性良好.

关 键 词:辉光放电电解等离子体  铜基底  超疏水表面

Fabrication of superhydrophobic copper-surface by using glow-discharge electrolysis plasma
GAO Jin-zhang,LI Ya-ping,LI Yan,LIU Hong-wei,TAO Li-hong.Fabrication of superhydrophobic copper-surface by using glow-discharge electrolysis plasma[J].Journal of Northwest Normal University Natural Science (Bimonthly),2012(2):42-46,56.
Authors:GAO Jin-zhang  LI Ya-ping  LI Yan  LIU Hong-wei  TAO Li-hong
Affiliation:(College of Chemistry and Chemical Engineering,Northwest Normal University,Lanzhou 730070,Gansu,China)
Abstract:An advanced oxidation technology,glow-discharge electrolysis plasma,has been successfully used in the fabrication of superhydrophobic copper-surfaces,that is,stearic acid is grafted onto the copper-substrate.To optimize the fabrication conditions,seven important parameters are examined in detail,such as the concentration of supporting electrolyte,stearic acid ethanol solution,discharge voltage,discharge time,species of alcohol,grafting time and temperature.The wettability,structure and ultimate composition of copper substrate are characterized by contact goniometer,X-ray diffraction(XRD),X-ray photoelectron spectroscopy(XPS),Fourier transform infrared spectroscopy(FT-IR),respectively.It is found that under the optimal conditions,the contact angle(CA) for the modified copper-substrate surfaces is up to 155.30° and the sliding angle(SA) less than 5°.
Keywords:glow-discharge electrolysis plasma  copper substrate  superhydrophobic surface
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