| 二甲亚砜中电沉积La—Co合金膜的研究 |
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| 引用本文： | 袁定胜,黄开胜,刘冠昆,童叶翔.二甲亚砜中电沉积La—Co合金膜的研究[J].中山大学学报(自然科学版),2001,40(4):84-87. |
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| 作者姓名： | 袁定胜 黄开胜 刘冠昆 童叶翔 |
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| 作者单位： | 中山大学化学与化学工程学院 |
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| 基金项目： | 广东省自然科学基金资助项目(960002) |
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| 摘 要： | 研究在非水溶剂二甲亚砜中电沉积La-Co合金膜。体系中加入柠檬酸为络合剂，聚乙醇－100为添加剂，用于改善沉积层的质量。在沉积过程中，应用了恒电位电解技术和脉冲电解技术。所得La-Co合金膜的表面是光滑，致密。粘附性好和有金属光泽。恒电位电解技术沉积得到的La-Co合金膜中La的质量分数是22．42％－50．29％，脉冲电解技术沉积得到的La-Co合金膜中La的质量分数是1．46％－42．63％。脉冲电解技术沉积得到的La-Co合金膜通过电镜观察发现金属粒子的大小约为100nm。
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| 关 键 词： | 二甲亚砜 镧－钴合金膜 电沉积 恒电位电解技术 脉冲电解技术 络合剂 添加剂 |
| 文章编号： | 0539-6579(2001)04-0084-04 |
| 修稿时间： | 2000年12月21 |
Electrodeposition of La-Co Alloy Films in Dimethylsulfoxide (DMSO) |
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| Yuan Dingsheng,HUANG Kaisheng,LIU Guankun,TONG Yexiang.Electrodeposition of La-Co Alloy Films in Dimethylsulfoxide (DMSO)[J].Acta Scientiarum Naturalium Universitatis Sunyatseni,2001,40(4):84-87. |
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| Authors: | Yuan Dingsheng HUANG Kaisheng LIU Guankun TONG Yexiang |
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| Abstract: | This paper reported the electrodeposition of La-Co alloy films in dimethylsulfoxide (DM50). Citric acid as the complexing agent and polyethylene glycol-l000 as the additive were discussed. Potentiostatic and pulse electrolysis techniques were used to prepare La-Co alloy films. Surfaces of alloy films obtained by these two techniques are smooth, adhesive, compact and metallic luster. The contents of La in alloy films obtained by potentiostatic electrolysis technique are in the range of 22.42% to 50.29%, while deposited by pulse electrolysis technique are in the range of 1.46% to 42.63%. The size of metal grains obtained by pulse technique is about 100 nm. |
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| Keywords: | rare earth lanthanum codeposition dimethylsulfoxide (DM50) La-Co alloy films |
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