| 离子注入金属饱和注量及浓度分布的计算和实验研究 |
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| 引用本文： | 张通和,姬成周.离子注入金属饱和注量及浓度分布的计算和实验研究[J].北京师范大学学报(自然科学版),1991,27(3):301-307. |
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| 作者姓名： | 张通和 姬成周 |
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| 作者单位： | 北京师范大学低能核物理研究所，北京师范大学低能核物理研究所，北京师范大学低能核物理研究所 100875，北京市新外大街，100875，北京市新外大街，100875，北京市新外大街 |
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| 摘 要： | Ti 注入钢的射程参数(1～1000keV)是用 TRIM87程序计算而得到的.考虑到高注量注入溅射效应的影响,利用 Schuilz 模型计算了 Ti 注入钢和 Al 中浓度分布.对此模型中饱和注量与离子射程的关系提出了修正.给出了表面浓度与射程关系表示式.为了提高注入效率,节省注入时间,利用这些修正式能方便地给出饱和注量和注入元素浓度分布.计算结果与低温下注入的实验结果相符合,而与加温(400℃)注入的实验结果偏离较大.也考虑了注入合金择优溅射和注入效率的问题.
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| 关 键 词： | 离子注入 钛 溅射 浓度分布 钢 |
THE PARAMETER CALCULATIONS FOR RANGE AND CONCENTRATION DISTRABUTION OF Ti IMPLANTATION IN STEEL TAKING ACCOANT INTO SPUTTERING AND EXPERIMENTS |
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| Zhang Tonghe Ji Chengzhou Shen Jinghua Institute of Low Energy Nuclear Physics,Beijing Normal University,Beijing,PRC.THE PARAMETER CALCULATIONS FOR RANGE AND CONCENTRATION DISTRABUTION OF Ti IMPLANTATION IN STEEL TAKING ACCOANT INTO SPUTTERING AND EXPERIMENTS[J].Journal of Beijing Normal University(Natural Science),1991,27(3):301-307. |
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| Authors: | Zhang Tonghe Ji Chengzhou Shen Jinghua Institute of Low Energy Nuclear Physics Beijing Normal University Beijing PRC |
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| Affiliation: | Zhang Tonghe Ji Chengzhou Shen Jinghua Institute of Low Energy Nuclear Physics,Beijing Normal University,100875,Beijing,PRC |
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| Abstract: | The parameter calculations of range are carried out using TRIM87 program.The results are given.The Ti concentration distribution are given using Schuilz model taking account into sputtering.Specially,the rela- tions of saturation retaining dose in steel on ion energy and equation of surface concentration are given.The model is improved.The covenient equa- tion of retaining dose calculation is obtained.The results are agree with Reynolds experimemts.The sputtering of a binary compound is considered for the calculation.The total sputtering coebbicionr is obtained for separate sputtering eoebbicients.The calculation of implantation efficiency is shown also. |
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| Keywords: | Ti implantation H13 steel calculation of range concentration distrabution sputtering binary sputtering |
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