| 热处理对Ta/Ni0.65Co0.35薄膜微结构和磁电阻性能的影响 |
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| 引用本文： | 王立锦,陈连康,郭歌,王云蛟,于亚多,于广华.热处理对Ta/Ni0.65Co0.35薄膜微结构和磁电阻性能的影响[J].北京科技大学学报,2009,31(3). |
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| 作者姓名： | 王立锦 陈连康 郭歌 王云蛟 于亚多 于广华 |
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| 作者单位： | 1. 北京科技大学材料科学与工程学院,北京,100083
2. 河北师范大学物理科学与信息工程学院,石家庄,050031 |
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| 基金项目： | 国家自然科学基金资助项目(No.50671008) |
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| 摘 要： | 选用磁致伸缩系数接近于零的软磁合金Ta/Ni0.65Co0.35作为磁敏感层,研究了热处理对Ta/Ni0.65Co0.35薄膜织构、磁学性能和磁电阻性能的影响.制备了Barber电极结构的磁电阻元件,对磁电阻元件的输出特性进行了测试.结果表明:真空退火可以有效降低薄膜内的应力和杂质缺陷,使晶粒尺寸增大,晶界对传导电子的散射减少,各向异性磁电阻(AMR)值提高;真空磁场退火有利于提高薄膜的单轴各向异性,使薄膜的AMR值和磁传感器元件的灵敏度增加.
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| 关 键 词： | 各向异性磁电阻（AMR） 薄膜材料 织构 传感器 灵敏度 |
Effects of heat treatment on the microstructure and magnetoresistance properties of Ta/Ni0.65Co0.35 films |
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| WANG Li-jin,CHEN Lian-kang,GUO Ge,WANG Yun-jiao,YU Ya-duo,YU Guang-hua.Effects of heat treatment on the microstructure and magnetoresistance properties of Ta/Ni0.65Co0.35 films[J].Journal of University of Science and Technology Beijing,2009,31(3). |
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| Authors: | WANG Li-jin CHEN Lian-kang GUO Ge WANG Yun-jiao YU Ya-duo YU Guang-hua |
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| Abstract: | Soft magnetic alloy Ta/Ni0.65Co0.35 films,whose magnetostriction coefficient is close to zero,were selected as sensitive layer.The effects of heat treatment on the microstructure and the anisotropic magnetoresistance(AMR)properties of Ta/Ni65Co35 films were investigated.A magnetic resistance element with Barber electrode structure was made and its output characteristics were tested.The results show that vacuum annealing can be effective in reducing the stress and impurity defect distribution in the films,in... |
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