| 磁控溅射Ni/Au/Pt多层膜红外发射率特征研究 |
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| 引用本文： | 黄智斌,周万城,唐秀凤,罗 发,朱冬梅.磁控溅射Ni/Au/Pt多层膜红外发射率特征研究[J].稀有金属材料与工程,2011,40(3):534-537. |
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| 作者姓名： | 黄智斌 周万城 唐秀凤 罗 发 朱冬梅 |
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| 作者单位： | 西北工业大学,凝固技术国家重点实验室,陕西,西安,710072 |
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| 基金项目： | 固技术国家重点实验室自主研究课题(KP200901) |
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| 摘 要： | 研究了表面镀Ni/Au/Pt多层膜的K424合金在热处理前后红外发射率的变化及变化机理。XRD分析结果表明，在热处理后，试样表面主要由 Au0.7Cr0.3和Pt组成，说明合金基体元素在600 ℃下会向外扩散。SEM分析表明，粗糙表面镀金膜的试样在热处理后，表面薄膜产生了细小的裂痕，但在表面没有探测到氧化物。而抛光表面镀金膜的试样，其表面薄膜十分完整。通过SR5000光谱辐射计量仪测量合金的红外发射率，结果表明，合金的表面状态和热处理对红外发射率均有较大影响
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| 关 键 词： | 镍基高温合金 Ni/Au/Pt多层膜 红外发射率 |
| 收稿时间： | 2010/3/25 0:00:00 |
Study on Infrared Emissivity Characteristic of Ni/Au/Pt Multilayer Films by Magnetic Sputtering |
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| Huang Zhibin,Zhou Wancheng,Tang Xiufeng,Luo Fa and Zhu Dongmei.Study on Infrared Emissivity Characteristic of Ni/Au/Pt Multilayer Films by Magnetic Sputtering[J].Rare Metal Materials and Engineering,2011,40(3):534-537. |
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| Authors: | Huang Zhibin Zhou Wancheng Tang Xiufeng Luo Fa and Zhu Dongmei |
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| Affiliation: | Huang Zhibin,Zhou Wancheng,Tang Xiufeng,Luo Fa,Zhu Dongmei(State Key Laboratory of Solidification Processing,Northwestern Polytechnical University,Xi'an 710072,China) |
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| Abstract: | The infrared emissivity characteristics and change mechanism of the superalloy K424 deposited with Ni/Au/Pt multilayer films were studied. After heat processing at 600 oC for 150 h, the films were analyzed by X-ray diffraction (XRD), SEM and EDS. The results show that the main compositions on the surface are Au0.7Cr0.3 and Pt, indicating that the substrate elements diffuse into the multilayer films. SEM analysis shows that there are lots of fine cracks on the rough sample, but oxides are not detected, while the surface of the polished samples is integrity after heat processing. The infrared emissivity was tested by spectral radiometer SR5000. The results show that both the surface state and heat processing have an important influence on the infrared emissivity |
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| Keywords: | Ni base superalloy Ni/Au/Pt multilayer films infrared emissivity |
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