| 电化学两步处理对精磨YG6硬质合金性能及金刚石涂层的影响 |
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| 引用本文： | 张湘辉,汪灵,龙剑平,常嗣和,朱必武,陈伟,冯艳华. 电化学两步处理对精磨YG6硬质合金性能及金刚石涂层的影响[J]. 工具技术, 2011, 45(8): 43-48 |
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| 作者姓名： | 张湘辉 汪灵 龙剑平 常嗣和 朱必武 陈伟 冯艳华 |
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| 作者单位： | 1. 成都理工大学材料与化学化工学院,成都理工大学金刚石薄膜实验室,610059成都市
2. 成都理工大学 |
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| 基金项目： | 国家自然科学基金资助项目(50974025,40572030); 四川省科技厅重点科技攻关项目(05GG021-001); 四川省教育厅自然科学重点科研项目(2003A142);四川省教育厅自然科学项目(07ZB009); 成都理工大学研究基金资助项目(2005GY02) |
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| 摘 要： | 采用电化学两步腐蚀法进行表面预处理研究,探讨了电化学腐蚀中电流类型、腐蚀时间等参数对精磨YG6硬质合金基体的影响；在此基体上,采用直流弧光放电等离子体CVD法制备了金刚石薄膜,并采用SEM、激光拉曼光谱仪、原子吸收分光光度计、电动轮廓仪、洛氏硬度计等进行了表征.结果表明:直、交电化学腐蚀都可以有效地去除YG6硬质合金基...
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| 关 键 词： | 电化学两步腐蚀法 金刚石薄膜涂层 直流弧光放电等离子体化学气相沉积 精磨硬质WC-6％wt-Co合金 |
Effects of Two-step Electro-polishing Pretreatment Method on Fine Grinding Cemented Carbide Substrates Surface Properties and Diamond Coatings |
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| Zhang Xianghui,Wang Ling,Long Jianping,Chang Sihe,Zhu Biwu,Chen Wei,Feng Yanhua. Effects of Two-step Electro-polishing Pretreatment Method on Fine Grinding Cemented Carbide Substrates Surface Properties and Diamond Coatings[J]. Tool Engineering(The Magazine for Cutting & Measuring Engineering), 2011, 45(8): 43-48 |
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| Authors: | Zhang Xianghui Wang Ling Long Jianping Chang Sihe Zhu Biwu Chen Wei Feng Yanhua |
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| Affiliation: | Zhang Xianghui,Doctoral Candidate,College of Materials and Chemistry & Chemical Engineering,Chengdu University of Technology,Chengdu 610059,China Wang Ling,Long Jianping,Chang Sihe,Zhu Biwu,Chen Wei,Feng Yanhua |
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| Abstract: | An investigation had been carried out to study the influence of the two-step electro-polishing pretreatment(firstly using electro-polishing,and then using acid etching) on the fine grinding cemented carbide substrates and diamond coatings.The texture structure,roughness,toughness and Co content of the WCCo substrates surface,quality and adhesion strength of diamond coatings deposited by DC arc discharge plasma CVD,were characterized by means of Scanning Electron Microscope(SEM),laser Raman spectrum,profilom... |
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| Keywords: | two-step electro-polishing pretreatment method diamond coatings fine grinding cemented carbide DC arc discharge plasma chemical vapor deposition |
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