| 硅吸除技术 |
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| 引用本文： | 蒋荣华,梁李成.硅吸除技术[J].半导体光电,1990,11(3):289-296. |
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| 作者姓名： | 蒋荣华 梁李成 |
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| 作者单位： | 峨眉半导体材料厂、所，峨眉半导体材料厂、所，峨眉半导体材料厂、所 四川峨眉 614200，四川峨眉 614200，四川峨眉 614200 |
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| 摘 要： | 本文详细地叙了各种硅吸除技术;阐明了非本征吸除、本征吸除和综合吸除的机理和工艺。举例说明了吸除技术的应用。
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| 关 键 词： | 硅 吸除技术 单晶材料 工艺 |
Silicon Gettering Technique |
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| Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory and Research Institute Emei,Sichuan.Silicon Gettering Technique[J].Semiconductor Optoelectronics,1990,11(3):289-296. |
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| Authors: | Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory and Research Institute Emei Sichuan |
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| Affiliation: | Jiang Ronghua Liang Licheng Xiao Shunzhen Emei Semiconductor Material Factory and Research Institute Emei,Sichuan 614200 |
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| Abstract: | Various kinds of silcon gettering techiques as well as the mechanism and technology are described in detail such as extrinsic,intrinsic and synthetic getter- ings.Examples are given.demonstrating the applications of the above gettering tech- niques. |
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| Keywords: | Silicon Gettering Technique |
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