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Correlation between Chemical Dopants and Topological Defects in Catalytically Active Nanoporous Graphene
Authors:Yoshikazu Ito  Yuhao Shen  Daisuke Hojo  Yoji Itagaki  Takeshi Fujita  Linghan Chen  Tsutomu Aida  Zheng Tang  Tadafumi Adschiri  Mingwei Chen
Affiliation:1. WPI Advanced Institute for Materials Research, Tohoku University, Sendai, Japan;2. PRESTO, Japan Science and Technology Agency, Saitama, Japan;3. State Key Laboratory of Polar Materials and Devices, Ministry of Education of China, East China Normal University, Shanghai, China;4. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Sendai, Japan;5. New Industry Creation Hatchery Center, Tohoku University, Sendai, Japan;6. CREST, Japan Science and Technology Agency, Saitama, Japan
Abstract:
Keywords:chemical vapor deposition  hydrogen evolution reaction  nanoparticles  nanoporous graphene  nitrogen–  sulfur–  phosphorus co‐doping
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