首页 | 官方网站   微博 | 高级检索  
     


New Electromagnetic Compatibility Instrumentation and Measurement Requirements and Techniques
Authors:White  Donald R J
Affiliation:White Electromagnetics, Inc. 670 Lofstrand Lane Rockville, Maryland 20853;
Abstract:This paper illustrates some fundamental instrumentation and measurment terms and the vague or midlesding manner in which they are frequently used. For example, the subject of accuracy is shown in four different common uses and interpretations. Misuse of the accuracy term is also illustrated in describing the performance of receiver linearity and dynamic range, the synthesis of recorder requirements and specifications, and the development of uncertainties in instrumentation and measurement. The damage results in either incorrect or poor decisions based on erroneous data, or wanton waste of dollars and effort by developing the wrong data, or both. Several examples are set forth on how a better technological communication can be effected. Some new instrumentation and measurement techniques recommended for use by the Electromagnetic Compatibility Community are presented. Regarding new instruments or updating of existing instruments, some examples described include statistical signal level detectors, peak-signal vs frequency plotting units, antenna pattern intercept platforms and equipments, and multi-channel crystal-video receivers with RF preamplification, peak detection and hold, and output sampling for X-Y plotting over 9 decades. Many of the EMC instrumentation techniques are borrowed from the EMW and ELINT Communities. Regarding measurement techniques, shielded enclosure attenuation, antenna pattern measurements using the sun as a signal generator and the conduct of electromagnetic site surveys are reviewed. Clearly, this paper covers only a few of a number of new opportunities awaiting EMC Community action.
Keywords:
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号