| 金刚石膜氧化行为的TGA分析 |
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| 引用本文： | 刘敬明,黄天斌,吕反修,唐伟忠,佟玉梅.金刚石膜氧化行为的TGA分析[J].材料热处理学报,2000,21(4):1-5. |
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| 作者姓名： | 刘敬明 黄天斌 吕反修 唐伟忠 佟玉梅 |
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| 作者单位： | 北京科技大学材料科学与工程学院,北京,100083 |
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| 基金项目： | 国家"863”高科技资助项目(715-002-Z030) |
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| 摘 要： | 采用热重分析法(TGA)对直流等离子体喷射制备的金刚石膜在空气中的氧化行为进行了研究,结果表明;直流等离子体喷射制备的金刚石膜氧化激活能为220KJ/mol,与天然金刚石的氧化激活能相当.用扫描电子显微镜(SEM)和Raman光谱对金刚石膜氧化前后的形貌和成分作了分析.结果表明金刚石膜在空气中氧化优先刻蚀晶界和孔隙,孔隙不断增加,晶界瓦解,金刚石膜成为一个个柱状单晶粉末;金刚石膜氧化前后未出现石墨或其它中间产物.
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| 关 键 词： | 金刚石膜 氧化 热重分析法(TGA) |
| 修稿时间： | 2000年3月27日 |
Thermogravimetric Analysis of the Oxidation of CVD Diamond Films Synthesized by DC Plasma Jet |
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| Liu Jingming,Huang Tianbin,Lu Fanxiu,Tang Weizhong,Tong Yumei.Thermogravimetric Analysis of the Oxidation of CVD Diamond Films Synthesized by DC Plasma Jet[J].Transactions of Materials and Heat Treatment,2000,21(4):1-5. |
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| Authors: | Liu Jingming Huang Tianbin Lu Fanxiu Tang Weizhong Tong Yumei |
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| Abstract: | Oxidation of polycrystalline free standing diamond film in air at temperature up to 1073K was investigated by thermogravimetry. The oxidation rates were measured between 973K to 1123K, to determine an activation energy of 220kJ/mol, which is similar to nature diamond. The diamond films before and after oxidation were characterized by SEM. The oxidation proceeds by etching preferentially grain boundary into the films,creating a highly porous structure. In end diamond films become a lot of spire like monocrystalline structure. Graphitization was not detected in partially oxidized samples by Raman. |
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| Keywords: | diamond films oxidation thermogravimetric analysis (TGA) |
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