基于悬浮张应变锗纳米薄膜的电致发光增强

基于准直接带隙的材料特性,锗材料已经成为硅基光电集成的研究热点。本文利用高应力氮化硅薄膜将应力引入锗纳米薄膜中,并成功制备出张应变锗纳米薄膜发光二极管。实验结果显示,制备出的发光二极管在室温下的电致发光有红移现象,这是由于应力作用下的锗材料能带变化引起的。另外,当在锗纳米薄膜中引入的应变达到1.92%时,所制备的发光二极管在1876nm峰值波长处的发光强度显著增加,证明了张应变锗纳米薄膜的直接带隙复合发光,进一步证实了应变锗材料在硅基光电集成应用上的广阔前景。

Enhanced electroluminescence from a free-standing tensilely strained germanium nanomembrane light-emitting diode

Ge has become a promising material for Si-based optoelectronic integrated circuits (OEIC) due to its pseudo-direct bandgap.In this paper we achieved tensilely strained Ge free-standing nanomembrane (NM) lightemitting diode (LED), using silicon nitride thin film with high stress.The tensile stress in the Ge layer can be controlled by adjustable process parameters.An expected redshift of electroluminescence (EL) in Ge NM LED is observed at room temperature, which has been attributed to the shrinking of its direct bandgap relative to its indirect bandgap.An EL with dramatically increased intensity was observed around 1876 nm at a tensile strain of 1.92%, which demonstrates the direct-band recombination in tensilely strained Ge NM.