首页 | 官方网站   微博 | 高级检索  
     

陶瓷球高效超光滑磁流变柔性抛光新工艺研究
引用本文:肖晓兰,阎秋生,潘继生,焦竞豪.陶瓷球高效超光滑磁流变柔性抛光新工艺研究[J].表面技术,2019,48(2):268-274.
作者姓名:肖晓兰  阎秋生  潘继生  焦竞豪
作者单位:广东工业大学 机电工程学院,广州,510006;广东工业大学 机电工程学院,广州,510006;广东工业大学 机电工程学院,广州,510006;广东工业大学 机电工程学院,广州,510006
基金项目:国家自然科学基金项目(51375097);广东省科技计划项目(2016A010102014);广东省自然科学基金项目(2015A030311044)
摘    要:目的为实现陶瓷球表面的高效超光滑抛光,提出一种集群磁流变抛光陶瓷球的新工艺。方法在传统V型槽抛光陶瓷球的基础上增加集群磁极和上盘旋转动力,配制适当的磁流变抛光液,通过在上下抛光盘的集群磁极,形成磁流变抛光垫包覆陶瓷球,进行研磨抛光加工。然后,基于陶瓷球工件几何运动学和动力学分析得到球体各运动参数的影响关系,利用机械系统分析软件ADAMS对成球过程进行动态仿真,可以看出该抛光方法能够主动控制球体的运动,实现球面抛光轨迹的快速均匀全包络。最后,根据仿真结果,通过调整上下抛光盘的转速比、偏心距和加工间隙等参数,控制陶瓷球的自转角,实现球面的快速高效超光滑抛光。结果用自行设计的陶瓷球集群磁流变抛光实验装置,对氮化硅陶瓷球进行抛光2.5 h,表面粗糙度Ra从60 nm左右下降到10 nm左右,球形误差为0.13μm,达到了陶瓷球轴承氮化硅球的国家标准(G5水平)。结论集群磁流变抛光方式可以实现球面抛光轨迹的快速均匀全包络,实现陶瓷球表面的高效超光滑抛光,值得进一步深入探讨研究。

关 键 词:陶瓷球  集群磁流变抛光  运动轨迹仿真  表面粗糙度  球度
收稿时间:2018/8/7 0:00:00
修稿时间:2019/2/20 0:00:00

A Novel Polishing Method for High Precision Ceramic Balls Based on Magnetorheological Polisher
XIAO Xiao-lan,YAN Qiu-sheng,PAN Ji-sheng and JIAO Jing-hao.A Novel Polishing Method for High Precision Ceramic Balls Based on Magnetorheological Polisher[J].Surface Technology,2019,48(2):268-274.
Authors:XIAO Xiao-lan  YAN Qiu-sheng  PAN Ji-sheng and JIAO Jing-hao
Affiliation:School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China,School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China,School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China and School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006, China
Abstract:The work aims to provide a new technology of clustered magneto rheological polishing for ceramic ball to realize the effective and supper-smooth polishing of ceramic ball surface. On the basis of the traditional V-groove polishing ceramic ball, the cluster magnetic pole and rotary motor of the upper plate were increased, and appropriate magnetorheological polishing liquid was prepared. The magnetorheological polishing pad was formed by the cluster magnetic pole of the upper and lower polishing plates for grinding and polishing. Based on geometric kinematics and dynamic analysis of ceramic ball work piece, the influence relation of various motion parameters of the ball was obtained. The ball forming process was simulated dynamically by the analysis software ADAMS in the mechanical system. This polishing method could actively control the motion of the sphere and realize the fast and uniform full envelope of the spherical polishing trajectory. According to the simulation results, the rotation angle of the ceramic ball was controlled by adjusting the parameters such as rotation speed, eccentricity and machining gap of the upper and lower polishing plates, so as to achieve fast and efficient super smooth polishing of the spherical surface. The silicon nitride ceramic balls were polished for 2.5 h with the self-designed magnetorheological polishing experimental device. The surface roughness Ra decreased from about 60 nm to about 10 nm, and the sphericity error was 0.13 mm, which reached the national standard (level of G5), the national standard for ceramic ball bearings. The clustered magnetorheological polishing method can realize fast uniform full envelope of spherical polishing trajectory, and achieve efficient ultra-smooth polishing on the surface of ceramic balls and can be studied further.
Keywords:ceramic ball  clustered magneto rheological polishing  motion trajectory simulation  surface roughness  sphericity
本文献已被 CNKI 万方数据 等数据库收录!
点击此处可从《表面技术》浏览原始摘要信息
点击此处可从《表面技术》下载全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号