溅射气压对铝合金表面HPPMS沉积钒薄膜摩擦学性能的影响

采用高功率脉冲磁控溅射(HPPMS)技术,在铝合金基体上制备V薄膜。研究溅射气压对V薄膜相结构、表面形貌及摩擦学性能的影响。结果表明:不同气压下制备的V薄膜中的V相仅沿(111)晶面生长,其衍射峰强度先增强后减弱,当气压为0.5Pa时,衍射峰最强且择优取向最明显;同时,V薄膜表面质量最好,其表面粗糙度最小仅为0.267nm。室温下V薄膜样品的耐磨性能与基体相比有大幅提高,当气压为0.5Pa时,摩擦系数可由基体的0.57下降到0.28,磨痕表面无明显的剥落迹象,表现出最佳的摩擦磨损性能。经过200和300℃加热处理后的V薄膜样品的摩擦系数与基体相比具有稳定的低值,这是由于表面氧化造成的。

Effects of Sputtering Pressure on Tribological Properties of Vanadium Films on Aluminum Alloy by High Power Pulsed Magnetron Sputtering

Vanadium films were prepared on the surface of aluminum alloy using a high power pulsed magnetron sputtering (HPPMS) method. The influences of the sputtering pressure on the phase structure, surface morphology and tribological properties of vanadium films have been investigated. Results show that the vanadium phase in the vanadium films only grows along the (111) crystal under different pressures. The diffraction peaks increase with increasing the pressure and decrease if the pressure further increasing. The diffraction peak of V(111) is the strongest and the preferred orientation is the most obvious when the pressure is 0.5 Pa. Meanwhile the vanadium film has the smoothest surface with the surface roughness of only 0.267 nm. The samples demonstrate much lower friction coefficient compared with the substrate at room temperature. The sample treated at 0.5 Pa possesses the best tribological properties with the friction coefficient decreasing from 0.57 to 0.28, and there is no obvious spalling on the worn surface. The friction coefficients of vanadium films annealed at 200 and 300 °C is low and stable compared with the unannealed samples, which is attributed to the surface oxidation