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Au/NiCr/Ta和Au/NiCr多层金属膜的划痕特征载荷
引用本文:唐武,马幼平,徐可为,王平,李弦.Au/NiCr/Ta和Au/NiCr多层金属膜的划痕特征载荷[J].金属学报,2002,38(4):407-410.
作者姓名:唐武  马幼平  徐可为  王平  李弦
作者单位:1. 西安交通大学金属材料强度国家重点实验室,西安,710049
2. 西安空间无线电技术研究所,西安,710000
基金项目:国家自然科学基金重点项目59931010,科技部中法先进研究计划项目 PRA MX9906资助~~
摘    要:采用摩擦力和声发射两种模式同时监测的划痕法研究了Au/NiCr/Ta和Au/NiCr多层金属薄膜的临界载荷Lc,并与TiN硬质薄膜进行了对比。实验结果表明:摩擦力和声发射模式均能反映出压头进入不同金属膜层时的变化,在单一金属薄膜层中两者均无大的变化,对应实验范围内不同的沉积温度,拐点特征载荷值基本不受其影响,而主要取决于多层膜的层厚和层数。

关 键 词:划痕法  金属薄膜  临界载荷  微波集成电路  薄膜器件
文章编号:0412-1961(2002)04-0407-04
修稿时间:2001年7月9日

SCRATCH CRITICAL LOAD OF Au/NiCr/Ta AND Au/NiCr METALLIC MULTILAYERS
TANG Wu,MA Youping,XU Kewei State Key Laboratory for Mechanical Behavior of Materials,Xi'an Jiaotong University,Xi'an WANG Ping,LI Xian The Xian Institute of Space Radio Technology,Xi'an Correspondent: XU Kewei,professor,Tel:.SCRATCH CRITICAL LOAD OF Au/NiCr/Ta AND Au/NiCr METALLIC MULTILAYERS[J].Acta Metallurgica Sinica,2002,38(4):407-410.
Authors:TANG Wu  MA Youping  XU Kewei State Key Laboratory for Mechanical Behavior of Materials  Xi'an Jiaotong University  Xi'an WANG Ping  LI Xian The Xian Institute of Space Radio Technology  Xi'an Correspondent: XU Kewei  professor  Tel:
Abstract:Au/NiCr/Ta and Au/NiCr metallic multilayers were deposited on A1203 substrate by magnetron sputtering and their critical load (La) was studied by scratch method with friction and acoustic emission mode, moreover, the scratch curve and morphology of metallic films were compared with TiN film. Both friction and acoustic emission mode can reflect the changes at different metallic film layers, but no obvious changes in singularity one.The scratch morphology was observed by SEM and elements distributions at different areas were measured by EDAX, which is in agreement with scratch stage. The critical load of metallic films was not sensitive to substrate temperature and heat-treatment technology, but sensitive to layer number and depth of metallic films.
Keywords:scratch method  metallic film  critical load  
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