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LSI掩模图形的布尔运算与拓扑分析算法及其实现
引用本文:薛舒,洪先龙.LSI掩模图形的布尔运算与拓扑分析算法及其实现[J].清华大学学报(自然科学版),1984(2).
作者姓名:薛舒  洪先龙
作者单位:计算机工程与科学系 (薛舒),计算机工程与科学系(洪先龙)
摘    要:LSI掩模图形的运算在版图分析和校验软件中占有重要的地位,而其中最核心的图形运算是布尔运算和拓扑分析。 本文首先回顾了以往的图形运算方法,并对它们进行了比较,然后提出了一种快速、省内存的算法:“三合一双扫描算法”,它不但可用于布尔运算,还适用于拓扑分析。文中详细叙述了算法过程以及用于不同布尔运算和拓扑分析项目的选定条件。最后对算法的复杂性进行了讨论。

关 键 词:版图分析  版图校验  布尔运算  拓扑分析  大规模集成电路计算机辅助设计

The Boollean Operation and Topological Analysis Algorithm for LSI Mask Artwork and its Implementation
Xue Shu,Hong Xianlong,.The Boollean Operation and Topological Analysis Algorithm for LSI Mask Artwork and its Implementation[J].Journal of Tsinghua University(Science and Technology),1984(2).
Authors:Xue Shu  Hong Xianlong  
Affiliation:Department of Computer Engineering and Science
Abstract:The operations for LSI mask artwork play an important role in the mask artwork analysis and verification software. The core in these operations is the boolean operation and topological analysis. A brief review and comparison of the previous algorithms for mask artwork were made in the paper. Then a new algorithm which is rapid and capable of saving the memory, is recommended. This algorithm is called "three in one algorithm with two scans". It can be used not only for the boolean operation, but also for the topological analysis. The algorithmic procedure and conditions of determination for different boolean operations and topological analyses are given in this paper. Finally, the complexity of the algorithm is discussed.
Keywords:mask artwork analysis  mask artwork verification  boolean opera- tion  topological analysis  CAD  
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