铝合金等离子体基离子注入形成AlN/TiN层结构研究

用X射线光电子能谱和小掠射角X射线衍射研究了铝合金LY12等离子体基离子注入形成的AlN/TiN改性层的结构。结果表明 ,N和Ti能注入铝合金表面 ,N在注入层呈类高斯分布 ,而Ti沿注入方向呈梯度递减。后注入的Ti和N对先注入的N的含量和分布有重要影响。同时注入Ti和N ,能在试样表面形成一层稳定的Ti,N层。所形成的AlN/TiN改性层主要由TiO2 ,TiN ,TiAl3 ,Al2 O3 ,AlN相组成

Studies of AlN/TiN Layers Aluminum Alloy Implanted by Plasma Based Ion Implantation

Surfaces of aluminum alloy LY12 were modified by growing AlN/TiN layers with plasma based ion implantation(PBII).The surface modification layers were studied with X ray photoelectron spectroscopy(XPS)and glancing X ray diffraction(GXRD).XPS results show that N and Ti can be implanted into LY12 alloy and the N depth profile is close to Gaussian distribution in the implanted layers,but Ti concentration gradually decreases in the implantation direction.We found that implantation sequence can be important.For example,the amount of Ti and N implanted considerably affects the concentration and distribution of N implanted previously;simultaneous implantation of Ti and N results in growth of stable layers of Ti and N on the surface.GXRD analysis reveals that the AlN/TiN layers consist of TiO 2,TiN,TiAl 3,Al 2O 3 and AlN.