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低折射率SiO2光学增透薄膜的结构控制
作者姓名:吴广明 王 珏 沈 军杨天河  赖珍荃张会林  张勤远范 滨周东平  张凤山
作者单位::吴广明 王 珏 沈 军 杨天河 赖珍荃 张会林 张勤远 同济大学波耳固体物理研究所 上海 200092
摘    要:A new method of structuralcontrol of low refraction index silica thin films is reported. Based on TEOS system andsol-gel process, together with organic dopant and silane coupling agent, themicrostructure of SiO2 particles in the sol is exactly controlled. Then silicathin films with 1.15~1.18 of refractive index are obtained by use of dip-coating. Thefilms are characterized by ellipsometer, spectrophotometer,SEM and TEM, respectively. Theexperimental results show that adjusting pH value of the sol can effectively control andkeep the microstructure of SiO2 sol, and the doping silane coupling agent makesparticles of SiO2 sol grow up.

关 键 词:溶胶-凝胶工艺 SiO
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