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Si含量对多元等离子体浸没离子注入与沉积技术制备TiAlSiN涂层微结构和机械性能的影响(英文)
引用本文:解志文,王小峰,黄磊,陆洋,闫久春.Si含量对多元等离子体浸没离子注入与沉积技术制备TiAlSiN涂层微结构和机械性能的影响(英文)[J].中国有色金属学会会刊,2011(Z2).
作者姓名:解志文  王小峰  黄磊  陆洋  闫久春
作者单位:哈尔滨工业大学先进焊接与连接国家重点实验室;
基金项目:Project(10875033)supported by the National Natural Science Foundation of China
摘    要:采用多元等离子体浸没离子注入与沉积制备TiAlSiN纳米复合涂层,利用EDX,XRD,SEM,XPS,纳米探针和划痕试验对涂层成分组成、微结构和机械性能进行测试分析。XRD测试表明,TiAlSiN涂层具有较强的TiN(200)择优取向。XPS测试表明,TiAlSiN涂层中也含有AlN、Si3N4、Al2O3和Ti2O3。与制备的TiN涂层相比,当涂层中的Si含量为0.9%时,TiAlSiN涂层表现出较高的硬度,达32GPa,但涂层的断裂韧性和结合强度较低;当涂层中的Si含量增加至6.0%时,TiAlSiN涂层具有超高的硬度57GPa,并表现出较好的断裂韧性和结合强度。

关 键 词:TiAlSiN  离子注入  沉积  结构  纳米硬度  

Influence of Si content on structure and mechanical properties of TiAlSiN coatings deposited by multi-plasma immersion ion implantation and deposition
XIE Zhi-wen,WANG Lang-ping,WANG Xiao-feng,HUANG Lei,LU Yang,YAN Jiu-chun State Key Laboratory of Advanced Welding , Joining,Harbin Institute of Technology,Harbin ,China.Influence of Si content on structure and mechanical properties of TiAlSiN coatings deposited by multi-plasma immersion ion implantation and deposition[J].Transactions of Nonferrous Metals Society of China,2011(Z2).
Authors:XIE Zhi-wen  WANG Lang-ping  WANG Xiao-feng  HUANG Lei  LU Yang  YAN Jiu-chun State Key Laboratory of Advanced Welding  Joining  Harbin Institute of Technology  Harbin  China
Affiliation:XIE Zhi-wen,WANG Lang-ping,WANG Xiao-feng,HUANG Lei,LU Yang,YAN Jiu-chun State Key Laboratory of Advanced Welding and Joining,Harbin Institute of Technology,Harbin 150001,China
Abstract:TiAlSiN nanocomposite coatings were prepared by multi-plasma immersion ion implantation and deposition (MPIIID). The chemical composition, microstructure and mechanical properties of these coatings were investigated by energy dispersive X-ray (EDX), scanning electron microscopy (SEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), nano-indentation and scratch tests. XRD patterns reveal that the main reflection in the as-deposited coating corresponds to a strong TiN (200) preferred orientat...
Keywords:TiAlSiN  ion implantation  deposition  structure  nanohardness  
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