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| 中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀 | |
| 引用本文： | 许生,侯晓波,范垂祯,赵来,周海军,吴克坚,高文波,颜远全,查良镇.中频反应溅射SiO2膜与直流溅射ITO膜的在线联镀[J].真空,2002(5):15-18. |
| 作者姓名： | 许生 侯晓波 范垂祯 赵来 周海军 吴克坚 高文波 颜远全 查良镇 |
| 作者单位： | 1. 深圳豪威光电子股份有限公司,广东,深圳,518057 2. 清华大学电子工程系,北京,100084 3. 深圳豪威光电子股份有限公司,广东,深圳,518057;深圳市真空技术工程研究开发中心,广东,深圳,518057 |
| 摘 要： | 多数ITO透明导电玻璃生产线在实现SiO2膜与ITO膜在线联镀时，应用SiO2靶射频溅射沉积SiO2膜工艺和ITO靶直流溅射沉积ITO膜工艺，如果SiO2膜应用硅靶反应磁控溅射工艺，存在这种工艺是否可以与ITO靶直流溅射沉积ITO膜工艺在线联用以及如何实现联用的问题。作者对现有的生产线进行了改造设计、加工，做了大量实验、质谱分析和多项测试研究，成功地实现反应溅射SiO2膜与ITO膜在线联镀，做到SiO2镀膜室的工作状态的变化基本上不影响ITO镀膜室的工艺条件。 |
| 关 键 词： | 中频反应溅射 SiO2膜 直流溅射 ITO膜 在线联镀 二氧化硅 透明导电玻璃 镀膜工艺 |
| 文章编号： | 1002-0322(2002)05-0015-04 |
| 修稿时间： | 2002年9月20日 |
On-line continuous deposition of SiO2 by medium frequency reactive sputtering and ITO by direct current sputtering |
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| XU Sheng ,HOU Xiao bo ,FAN Chui zhen ,ZHAO Lai ,ZHOU Hai jun ,WU Ke jian ,GAO Wen bo ,YAN Yuan quan ,CHA Liang zhen.On-line continuous deposition of SiO2 by medium frequency reactive sputtering and ITO by direct current sputtering[J].Vacuum,2002(5):15-18. | |
| Authors: | XU Sheng HOU Xiao bo FAN Chui zhen ZHAO Lai ZHOU Hai jun WU Ke jian GAO Wen bo YAN Yuan quan CHA Liang zhen |
| Affiliation: | XU Sheng 1,HOU Xiao bo 2,FAN Chui zhen 1,3,ZHAO Lai 2,ZHOU Hai jun 1,WU Ke jian 1,3,GAO Wen bo 1,3,YAN Yuan quan 1,3,CHA Liang zhen 2 |
| Abstract: | It's popular to deposit SiO 2 film by radio frequency(RF) sputtering and ITO film by direct current(DC) sputtering for continuous deposition in a ITO production line. However, it will affect the technology of the deposition of ITO in sequence to deposit the SiO 2 film by reactive sputtering. The disturbance is studied by experiments of a mass of spectrum measurements and so on, and the line is reconsidered and modified. The continuous deposition of SiO 2 by medium frequency(MF) reactive sputtering and ITO by DC sputtering is realized without disturbance of the chamber of SiO 2 reactive deposition to ITO technology. |
| Keywords: | reactive sputtering SiO 2 ITO on line continuous deposition |
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