| 添加剂对Cu/Co多层膜电结晶成核机理及磁性的影响 |
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| 引用本文： | 曹为民,石新红,印仁和,姬学彬,张磊,曹赟.添加剂对Cu/Co多层膜电结晶成核机理及磁性的影响[J].电镀与精饰,2007,29(1):1-4,26. |
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| 作者姓名： | 曹为民 石新红 印仁和 姬学彬 张磊 曹赟 |
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| 作者单位： | 上海大学理学院,化学系,上海,200444 |
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| 基金项目： | 国家自然科学基金(20271062)，上海市教委青年基金(02AQ83)资助项目 |
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| 摘 要： | 在硼酸镀液中以单晶S i(111)为基底用双槽法制备Cu/Co多层膜,在镀液中分别加入了镀铜添加剂2000#和镀钴添加剂5#。探讨了镀层电结晶成核机理,在基础镀液中铜电结晶为三维连续成核过程,钴电结晶在较低电位下为三维连续成核,在较高电位下为三维瞬时成核过程。加入添加剂后,铜、钴电结晶均为三维瞬时成核过程。测试了Cu/Co多层膜的磁性能;添加剂能提高多层膜的磁性能,无添加剂的Cu/Co多层膜的巨磁阻(GMR)值约为5%,而在加入了添加剂后,其GMR值高达52%。
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| 关 键 词： | 电结晶 Cu/Co多层膜 成核 巨磁阻效应 |
| 文章编号： | 1001-3849（2007）01-0001-04 |
| 收稿时间： | 2006-04-29 |
| 修稿时间： | 2006-04-29 |
Effect of Additives on Mechanism of Nucleation and Magnetic Property of Cu/Co Multilayers |
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| CAO Wei-min,SHI Xin-hong,YIN Ren-he,JI Xue-bin,ZHANG Lei,CAO Yun.Effect of Additives on Mechanism of Nucleation and Magnetic Property of Cu/Co Multilayers[J].Plating & Finishing,2007,29(1):1-4,26. |
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| Authors: | CAO Wei-min SHI Xin-hong YIN Ren-he JI Xue-bin ZHANG Lei CAO Yun |
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| Affiliation: | School of Science, Shanghai University, Shanghai 200444, China |
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| Abstract: | Cu/Co multilayers were prepared on monocrystalline silicon(111) by using double-bath method in boric acid solution with additives added.The effects of additives on Cu/Co multilayers and the mechanism of nucleation were studied.The experiment results show that the growth kinetics for Cu is consistent with progressive nucleation.(And) for Co,there is a transition from progressive to instantaneous nucleation at about 1.2 V.In addition,GMR values were measured by PPMS at room temperature.The results show that: Additives can enormously improve the magnetism of the multilayers.GMR value of Cu/Co multilayers without additives was only about 5%.While with additives,the GMR value was up to 52%. |
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| Keywords: | electrocrystallization Cu/Co multilayers nucleation giant magnetoresistance |
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