薄膜厚度对ZnO:Ti透明导电薄膜光电性能的影响

利用直流磁控溅射法在室温水冷玻璃衬底上制备出可见光透过率高、电阻率低的掺钛氧化锌(ZnO∶Ti)透明导电薄膜。SEM和XRD研究结果表明,ZnO∶Ti薄膜为六角纤锌矿结构的多晶薄膜,且具有c轴择优取向。讨论了薄膜厚度对掺钛氧化锌透明导电薄膜光学、电学性能的影响。当薄膜厚度为835nm时,薄膜具有最低电阻率3.34×10-4Ω.cm。所制备薄膜附着性能良好,在波长为500～800nm的可见光中平均透过率均超过91%,ZnO∶Ti薄膜可用作薄膜太阳电池和液晶显示器的透明电极。

THICKNESS DEPENDENCE OF STRUCTURAL, OPTICAL AND ELECTRICAL PROPERTIES OF ZnO:Ti FILMS PREPARED ON WATER-COOLED GLASS SUBSTRATE

Transparent conducting Titanium-doped zinc oxide films with high transparency and relatively low resistivity have been successfully prepared on watercooled substrates by direct current magnetron sputtering at room temperature.Micro-structural,morphological and optic-electrical properties of ZnO∶Ti films were investigated.Experimental results showed that the thickness plays an important role on the microstructure and electrical resistivity of ZnO∶Ti films.All the deposited films are polycrystalline with a hexagonal structure and a preferred orientation perpendicular to the substrates along the c-axis.The crystallite size increases and the electrical resistivity decreases when the thickness increases from 206nm to 835nm.When the thickness is 835nm,it was obtained that the lowest resistivity is 3.34×10-4Ω·cm.The crystallite size decreases and the electrical resistivity increases when the thickness increases from 835nm to 1078nm.All the films present a high transmittance of above 91% in the visible range.ZnO∶Ti films with high transparency and relatively low resistivity deposited on glass substrates at room temperature will be used as transparent electrode in thin film solar cells and liquid crystal displays.