| 工艺参数对磁控溅射WO_3薄膜电致变色性能的影响 |
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| 引用本文： | 汤全丰,李海增,王宏志,张青红,李耀刚,陈 培.工艺参数对磁控溅射WO_3薄膜电致变色性能的影响[J].现代技术陶瓷,2017,38(2):142-149. |
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| 作者姓名： | 汤全丰 李海增 王宏志 张青红 李耀刚 陈 培 |
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| 作者单位： | 东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620,东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620,东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620,东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620,东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620,东华大学 材料科学与工程学院 先进玻璃制造技术教育部工程研究中心，上海201620 |
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| 基金项目： | 广东省科技计划 (2016B090932003)。 |
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| 摘 要： | 本文采用磁控溅射法制备了用于电致变色器件的WO_3薄膜,用X射线衍射仪(XRD)、场发射扫描电镜(FE-SEM)、紫外-可见分光光度计(UV-Vis)对其物相组成、微观形貌以及电致变色性能进行了表征。结果表明:在溅射压强为2 Pa、氩氧比为60:20时所制备的WO_3薄膜厚度适中,且有利于离子的嵌入/脱出,而以此薄膜制备的电致变色器件光调制范围最大,褪色时间最短,着色效率达82.9 cm~2/C。
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| 关 键 词： | 磁控溅射 WO3薄膜 电致变色器件 氩氧比 |
Effects of Process Parameters on the Electrochromic Properties of WO3 Films Prepared by Magnetron Sputtering |
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| TANG Quan-Feng,LI Hai-Zeng,WANG Hong-Zhi,ZHANG Qing-Hong,LI Yao-Gang and CHEN Pei.Effects of Process Parameters on the Electrochromic Properties of WO3 Films Prepared by Magnetron Sputtering[J].Advanced Ceramics,2017,38(2):142-149. |
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| Authors: | TANG Quan-Feng LI Hai-Zeng WANG Hong-Zhi ZHANG Qing-Hong LI Yao-Gang and CHEN Pei |
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| Affiliation: | Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China,Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China,Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China,Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China,Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China and Engineering Research Center of Advanced Glasses Manufacturing Technology, College of Materials Science and Engineering, Donghua University, Shanghai 201620, China |
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| Abstract: | In this paper, WO3 films for electrochromic devices were prepared by magnetron sputtering. The phase composition, microstructure and electrochromic properties were characterized by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM) and ultraviolet-visible spectrophotometer (UV-Vis). The results showed that WO3 films prepared at the sputtering pressure of 2 Pa and argon/oxygen ratio of 60:20 were suitable for the intercalation/ deintercalation of ions, and the electrochromic devices prepared by this thin film showed maximum range of modulation, the shortest fade time, and the coloring efficiency reached to 82.9 cm2/C. |
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| Keywords: | Magnetron sputtering WO3 thin film Electrochromic device Ar/O2 ratio |
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