| 可调谐TEACO_2激光辐照SiH_4击穿过程的研究 |
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| 引用本文： | 张连水,张贵银,傅广生,韩理,张开锡.可调谐TEACO_2激光辐照SiH_4击穿过程的研究[J].中国激光,1992,19(8):624-626. |
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| 作者姓名： | 张连水 张贵银 傅广生 韩理 张开锡 |
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| 作者单位： | 河北大学物理系，河北大学物理系，河北大学物理系，河北大学物理系，河北大学物理系 071002，071002 华北电力学院，071002，071002，071002 |
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| 基金项目： | 国家自然科学基金资助项目 |
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| 摘 要： | 一、引言 激光等离子体淀积硅膜在半导体工业得到广泛应用。在这种技术中,SIH。通常被用做各种硅膜生长的高纯硅源。现已有很多关于SIH_4激光等离子体淀积过程的报道~1～3],其中普遍
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| 收稿时间： | 1990/7/9 |
Study on the process of SiH_4 breakdown irradiated by frequency tunable TEA CO_2 laser |
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| Zhang Lianshuj,Zhang Guiyin,Fit Guangsheng,Hun Li,Zhang Kaixi.Study on the process of SiH_4 breakdown irradiated by frequency tunable TEA CO_2 laser[J].Chinese Journal of Lasers,1992,19(8):624-626. |
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| Authors: | Zhang Lianshuj Zhang Guiyin Fit Guangsheng Hun Li Zhang Kaixi |
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| Abstract: | The process of SiH4/Ar breakdown irradiated by frequency tunable TEA CO2 laser has been studied. The breakdown threshold of SiH4/Ar has been measured as a funotiou. of laser energy, laser frequency and gas pressure. Based on the experimental results, the physical process of 8iH4/Ar breakdown is proposed to be a process of optic-breakdown through resonant absorption of laser beams |
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| Keywords: | threshold CO_2 laser SiH_4 breakdown |
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