WO3/NiWO4复合薄膜的制备及其光电化学性能

采用两步水热法在导电玻璃(FTO)上制备了WO₃/NiWO₄复合薄膜。通过XRD,SEM表征了WO₃/NiWO₄复合薄膜的组成结构及微观形貌,利用UV-Vis、光电流测试、光电催化测试和交流阻抗测试分析了WO₃/NiWO₄复合薄膜的光电性能。结果表明:WO₃/NiWO₄复合薄膜相较于WO₃薄膜具有更好的光吸收特性、光电流密度和光电催化活性,其中水热反应3h的WO₃/NiWO₄复合薄膜的光电化学性能最佳。WO₃/NiWO₄-3h在1.4V(vs.Ag/AgCl)时的光电流密度为1.94mA/cm²,光电催化210min对亚甲基蓝溶液的降解效率为57.1%。交流阻抗图谱表明WO₃/NiWO₄薄膜的电荷转移电阻小于WO₃薄膜,光电化学性能更优。

Preparation and Photoelectrochemical Properties of WO3/NiWO4 Composite Film

A two-step hydrothermal method was applied to create WO₃/NiWO₄ composite films on conductive glass (FTO). The structure and morphology of WO₃/NiWO₄ composite films were characterized by XRD and SEM. The photoelectric properties of WO₃/NiWO₄ composite films were analyzed by UV-VIS, photocurrent test, photoelectrocatalytic test and AC impedance test. The analysis results indicate that the WO₃/NiWO₄ composite film has better light absorption characteristics, photocurrent density and photoelectrocatalysis activity than WO₃ film, and the WO₃/NiWO₄ composite film with 3 hours hydrothermal reaction has the best photoelectrochemical properties. The photocurrent density of WO₃/NiWO₄-3h was 1.94mA/cm² at 1.4V(vs. Ag/AgCl), and the photoelectrocatalytic efficiency of WO₃/NiWO₄-3h for methylene blue solution was 57.1% for 210min. The AC impedance diagram reveals that the charge transfer resistance of WO₃/NiWO₄ film is less than that of WO₃ film, which corresponds to improved photoelectrochemical properties.