Properties of super-hard carbon films deposited by pulsed arc process |
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Authors: | Werner Grimm Volker Weihnacht |
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Affiliation: | a INOVAP Vakuum und Plasmatechnik GmbH Dresden, Bautzner Landstraße 45, D-01454 Großerkmannsdorf, Germany b Fraunhofer Institut Werkstoff- und Strahltechnik, Winterbergstr. 28, D-01277 Dresden, Germany |
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Abstract: | The pulsed vacuum arc discharge (pulsed arc) is the most efficient PVD-technology for the deposition of super-hard carbon films on tools and machinery parts. Using the pulsed arc discharge a stable evaporation process of carbon and an efficient deposition of hydrogen-free ta-C type films is possible. In this paper, important properties of such ta-C films and their process conditions are explained. The films were characterized by hardness measurements using nanoindentation, friction and wear properties using oscillating sliding tests, and structural analysis using Raman spectroscopy. |
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Keywords: | DLC Vacuum arc Pulsed dc-arc |
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