溅射法制备ZnO薄膜结构及光学特性

采用直流磁控溅射镀膜工艺在玻璃基片上沉积了具有良好c轴择优取向的znO薄膜.用组合式多功能光栅光谱仪测得透光率均在85%以上;用AXRF分析了退火前后薄膜的物相,并用原子力显微镜分析了薄膜的表面形貌.样品通过空气中退火,薄膜结晶质量明显提高,晶粒有所长大,取向更加一致.在室温下用荧光分光光度计分析了薄膜的发光特性,观测到明显的紫外光发射(波长为386 nm)和波峰为528nm的一"绿带"宽峰.紫外发射是由于导带和价带之间的电子跃迁,宽峰是源于晶体的缺陷.

Structure and Optical Properties of ZnO Films Prepared by Sputtering

C-axis uniquely oriented ZnO films were prepared by DC magnetron sputtering process on glass substrate.The entire transmittance rate was beyond 85% which was measured by grating spectrograph.XRD and atomic force microscope were used to analyze the surface morphology and fine texture.After,the thin film was annealed in the air,crystallization tended to be more complete,texture tended to be more compact and the crystal grain growth was found.Strong UV photoluminescence(PL) located at 386 nm and a wide green P...