首页 | 官方网站   微博 | 高级检索  
     


A simple fabrication process for SiNx/SiO2 waveguide based on sidewall oxidation of patterned silicon substrate
Authors:Ya’nan Wang  Bing Xiong  Changzheng Sun  Jian Wang  Zhibiao Hao
Affiliation:Tsinghua National Laboratory for Information Science and Technology/State Key Lab of Integrated Optoelectronics, Department of Electronic Engineering, Tsinghua University, Beijing, P.R. China.
Abstract:
Keywords:Optical waveguide  integrated optics  patterned substrate  thermal annealing
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司    京ICP备09084417号-23

京公网安备 11010802026262号