| 氮化铝基片的集群磁流变抛光加工 |
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| 引用本文： | 白振伟,阎秋生,路家斌,潘继生,祝江停.氮化铝基片的集群磁流变抛光加工[J].金刚石与磨料磨具工程,2011,31(5):35-38. |
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| 作者姓名： | 白振伟 阎秋生 路家斌 潘继生 祝江停 |
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| 作者单位： | 广东工业大学机电工程学院,广州,510006 |
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| 基金项目： | 国家自然科学基金(No.50875050); NSFC-广东联合基金(U1034006); 广东省自然科学基金(No.9251009001000009)资助 |
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| 摘 要： | 本文进行了氮化铝基片的集群磁流变抛光加工研究,分析了主要工艺参数的影响和加工表面形貌特征.实验结果表明:集群磁流变抛光加工氮化铝基片可以实现高效率超光滑抛光,原始表面Ra1.730 2μm抛光60 min后可以达到Ra0.037 8μm.选用碳化硅磨料,磨料质量浓度为0.05 g/mL,工件与抛光盘转速比为5.8左右,...
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| 关 键 词： | 氮化铝基片 集群磁流变效应 抛光 表面粗糙度 |
Polishing AlN substrate by cluster magnetorheological effect |
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| Bai Zhenwei,Yan Qiusheng,Lu jiabin,Pan Jisheng,Zhu Jiangting.Polishing AlN substrate by cluster magnetorheological effect[J].Diamond & Abrasives Engineering,2011,31(5):35-38. |
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| Authors: | Bai Zhenwei Yan Qiusheng Lu jiabin Pan Jisheng Zhu Jiangting |
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| Affiliation: | Bai Zhenwei Yan Qiusheng Lu jiabin Pan Jisheng Zhu Jiangting(Guangdong University of Technology,Guangzhou 510006,China) |
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| Abstract: | The polishing of AlN substrate by cluster magnetorheological（MR） effect technology is researched,and the influence of the preliminary experimental parameters and the feature of machined surface morphology are studied.Experimental result demonstrates that cluster MR-effect plane polishing AlN substrate is feasible and it can achieve ultra smooth polishing with high efficiency,after 60 minutes polishing the original surface roughness was decreased from Ra1.730 2 μm to Ra 0.037 8 μm.Smoother machined surface and higher material removal were obtained when we selected appropriate machining parameters including SiC abrasive（mass concentration0.05 g/mL）,the speed ratio between workpiece and polishing disc about 5.8,smaller machining gap during the initial polishing and larger machining gap during the final polishing. |
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| Keywords: | AlN substrate cluster magnetorheological effect polishing surface roughness |
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