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PZT铁电薄、厚膜及其制备技术研究进展
引用本文:夏冬林,刘梅冬,徐慢,赵修建.PZT铁电薄、厚膜及其制备技术研究进展[J].材料导报,2004,18(10):64-67.
作者姓名:夏冬林  刘梅冬  徐慢  赵修建
作者单位:1. 武汉理工大学硅酸盐材料工程教育部重点实验室,武汉,430070
2. 华中科技大学电子科学与技术系,武汉,430074
基金项目:国家高技术研究发展计划(863计划)
摘    要:铁电薄、厚膜材料具有良好的铁电、压电、热释电、电光及非线性光学特性,在微电子学、光电子学、集成光学和微电子机械系统等领域有许多重要的应用.近年来,随着铁电薄、厚膜制备技术的发展,PZT厚膜材料及厚膜器件成为科学工作者研究的热点.介绍了PZT铁电薄、厚膜材料与器件的研究进展以及PZT铁电薄、厚膜制备技术及几种典型的PZT铁电薄、厚膜材料制备技术的特点,并指出了目前存在的一些问题和未来的发展方向.

关 键 词:铁电薄膜  铁电厚膜  制备技术

Progress in PZT Ferroelectric Thin or Thick Films and Preparation Technology
XIA Donglin LIU Meidong XU Man ZHAO Xiujian.Progress in PZT Ferroelectric Thin or Thick Films and Preparation Technology[J].Materials Review,2004,18(10):64-67.
Authors:XIA Donglin LIU Meidong XU Man ZHAO Xiujian
Affiliation:XIA Donglin~1 LIU Meidong~2 XU Man~1 ZHAO Xiujian~1
Abstract:Ferroelectric thin/thick films have excellent ferroelectric, piezoelectric, pyroelectric, electric-optic,acoustooptic and nonlinear optic properties. They have many important applications in some fields such as microelectronics, optoelectronics, integrated optics and micro-electro-mechanical system(MEMS). In recent years, with the development of preparation techniques of ferroelectric thin/thick films, the research on PZT thin/thick films materials and devices has received much attention. Recent progresses on PZT ferroelectric materials and preparation technology of PZT ferroelectric thin films or thick films are reviewed, and some characteristics of preparation technology of PZT ferroelectric thin films or thick films. The paper also points out some existing problems and predicts future developmental directions.
Keywords:PZT
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