Single digit nanofabrication by step-and-repeat nanoimprint lithography |
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Authors: | Peroz C Dhuey S Cornet M Vogler M Olynick D Cabrini S |
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Affiliation: | aBeam Technologies, 5286 Dunnigan Court, Castro Valley, CA 94546, USA. cp@abeamtech.com |
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Abstract: | A novel strategy for fabricating nanoimprint templates with sub-10 nm patterns is demonstrated by combining electron beam lithography and atomic layer deposition. Nanostructures are replicated by step-and-repeat nanoimprint lithography and successfully transferred into functional material with high fidelity. The process extends the capacity of step-and-repeat nanoimprint lithography as a single digit nanofabrication method. Using the ALD process for feature shrinkage, we identify a size dependent deposition rate. |
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