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Inline‐Analyse hoher Präzision an photovoltaischen Schichtsystemen mittels RFA
Authors:Joachim Piltz
Abstract:In‐line analysing of photovoltaic layers with high precision by X‐ray fluorescence The effective control of coating process requires to ascertain online information on the current coating thickness and the stoichiometry. New instruments for energy dispersive X‐ray fluorescence analysis (EDXRF) allow to measure single‐, multi‐ or alloy layers in the thickness range from 20 nm to 50 μm on different substrates (metal, plastics). It is necessary to design an optimal route of the X‐ray line. To reach a maximum measuring effect it is possible to minimize the statistical error for a short measuring period. Observing the condition of a real coating process is important to guarantee the measuring parameters over the whole operation period. A special protection system for each measuring unit against the process influences has to build up. Some design rules for construction and the software are discussed. Real measuring unit is shown.
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