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稳定剂对低磷化学镀镍液及镀层的影响
引用本文:郑振,李宁,黎德育.稳定剂对低磷化学镀镍液及镀层的影响[J].电镀与环保,2009,29(1).
作者姓名:郑振  李宁  黎德育
作者单位:哈尔滨工业大学应用化学系,黑龙江,哈尔滨,150001
摘    要:在基础低磷化学镀镍液中,分别添加硫脲(TU)、KI、KIO3、含硫有机杂环化合物A和CuSO4等稳定荆,考察其对镀液的稳定性能、镀速、镀层中磷的质量分数和可焊性等的影响.研究表明:化合物A的加入能使镀液稳定性上升,并且可以进一步降低镀层中磷的质量分数.合适稳定荆的加入,不但可以提高镀液的稳定性,同时还能够获得镀速更快、磷的质量分数更低,并且可焊性良好的低磷化学镀镍层.

关 键 词:化学镀镍  低磷  稳定剂  可焊性

Effects of Stabilizers on Stability of Low-P Electroless Nickel Bath and Deposit
ZHENG Zhen,LI Ning,LI De-yu.Effects of Stabilizers on Stability of Low-P Electroless Nickel Bath and Deposit[J].Electroplating & Pollution Control,2009,29(1).
Authors:ZHENG Zhen  LI Ning  LI De-yu
Affiliation:Department of Applied Chemistry;Harbin Institute of Technology;Harbin 150001;China
Abstract:To basic electroless nickel bath,five electroless nickel bath stabilizers of TU,KI,KIO_3,organic heterocyclic compound A containing sulfur,and CuSO_4 were added respectively,and the effects of these five stabilizers on the stability of electroless nickel bath,deposition rate,the mass fraction of P and soldering capability of the layer were investigated.The results show that A is an excellent electroless nickel bath stabilizer,which can not only stabilize the bath very well but also decrease the mass fractio...
Keywords:electroless nickel plating  low-P: stabilizer  soldering capability  
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