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Cd掺杂BZCN薄膜的制备及其介电性能
引用本文:张凯,蒋书文,程鹏,张鹰,齐增亮.Cd掺杂BZCN薄膜的制备及其介电性能[J].电子元件与材料,2007,26(5):33-35.
作者姓名:张凯  蒋书文  程鹏  张鹰  齐增亮
作者单位:电子科技大学电子薄膜与集成器件国家重点实验室,四川,成都,610054
基金项目:高等学校博士学科点专项科研项目
摘    要:用射频磁控溅射法,在Pt/Si基片上制备了立方烧绿石结构的Cd掺杂Bi1.5Zn0.7Cd0.3Nb1.5O7(BZCN)薄膜。研究了衬底温度对薄膜结构、表面形貌以及介电性能的影响。结果表明,沉积温度为600℃,退火温度为700℃制备的薄膜,在测试频率为100 kHz,测试电场强度为1.33×106 V/cm的条件下,介电可调率达到11.8%,tanδ小于0.004 2。

关 键 词:无机非金属材料  Cd掺杂BZCN薄膜  射频磁控溅射  介电性能  介电可调率
文章编号:1001-2028(2007)05-0033-03
修稿时间:2007-01-15

Preparation of Cd-doped BZCN thin film and its dielectric properties
ZHANG Kai,JIANG Shu-wen,CHENG Peng,ZHANG Ying,QI Zhen-liang.Preparation of Cd-doped BZCN thin film and its dielectric properties[J].Electronic Components & Materials,2007,26(5):33-35.
Authors:ZHANG Kai  JIANG Shu-wen  CHENG Peng  ZHANG Ying  QI Zhen-liang
Abstract:The Bi1.5Zn0.7Cd0.3Nb1.5O7(BZCN) thin films of cubic pyrochlore phase were prepared on Pt/Si substrate using RF magnetron sputtering method.Investigated were the effects of substrate temperature on the structures and surface morphology,dielectric properties of films.The BZCN thin films sputtered with a deposited temperature of 600 ℃ and annealed temperature at 700 ℃ showed a dielectric tunability of 11.8 %,tan δ lower than 0.0042 at E of 1.33×106 V/cm and measurement frequency of 100 kHz.
Keywords:non-metallic inorganic material  Cd-doped BZCN thin film  RF magnetron sputtering  dielectric properties  dielectric tunability
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