| PECVD氮化硅薄膜工艺参数研究 |
| |
| 引用本文： | 张树明,廖华,何京鸿,尹云坤,胡俊涛,罗群.PECVD氮化硅薄膜工艺参数研究[J].云南师范大学学报(自然科学版),2011(5). |
| |
| 作者姓名： | 张树明 廖华 何京鸿 尹云坤 胡俊涛 罗群 |
| |
| 作者单位： | 云南师范大学太阳能研究所;昆明医学院;云南天达光伏科技股份有限公司; |
| |
| 摘 要： | 根据太阳电池组件的结构和封装材料特性,设计出硅太阳电池片减反射薄膜的最佳厚度和折射率,利用泰勒公式进行优化PECVD制备氮化硅薄膜的工艺参数。通过实验,找出适合中电48所工业生产用管式PECVD制备氮化硅薄膜的工艺参数。
|
| 关 键 词： | PECVD氮化硅减反射膜 工艺参数 优化 |
Optimized the Parameters in Process of PECVD Deposition Silicon Nitride Film |
| |
| ZHANG Shu-ming,LIAO Hua,HE Jing-hong,YIN Yun-kun,HU Jun-tao,LUO Qun.Optimized the Parameters in Process of PECVD Deposition Silicon Nitride Film[J].Journal of Yunnan Normal University (Natural Sciences Edition),2011(5). |
| |
| Authors: | ZHANG Shu-ming LIAO Hua HE Jing-hong YIN Yun-kun HU Jun-tao LUO Qun |
| |
| Affiliation: | ZHANG Shu-ming1,2,LIAO Hua1,HE Jing-hong1,YIN Yun-kun3,HU Jun-tao3,LUO Qun2(1.Solar Energy Research Institute,Yunnan Normal University,Kunming 650092,China,2.Kunming Medical University,Kunming 650032,3.Yunnan TIANDA Photovoltaic Technology Co.,Ltd,China) |
| |
| Abstract: | According to the structure of solar modules and the performance of encapsulating material,the best antireflection film thickness and refractive index have been designed for silicon solar cell,and the technical parameters have been optimized with TAYLOR formula.Through the experiments,the good deposition parameters have been obtained for CETC-48th tube PECVD equipment. |
| |
| Keywords: | PECVD silicon nitride film Parameters Optimization |
| 本文献已被 CNKI 等数据库收录！ |
|
