High quality interpoly dielectrics deposited on thenitrided-polysilicon for nonvolatile memory devices |
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Authors: | Wen Luh Yang Tien Sheng Chao Chun-Ming Cheng Tung Ming Pan Tan Fu Lei |
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Affiliation: | Dept. of Electr. Eng., Feng Chia Univ., Taichung ; |
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Abstract: | High quality interpoly dielectrics have been fabricated by using NH3 and N2O nitridation on polysilicon and deposition of tetra-ethyl-ortho-silicate (TEOS) oxide with N2O annealing. The surface roughness of polysilicon is improved and the value of weak bonds is reduced due to nitrogen incorporation at the interface, which improves the integrity of interpoly dielectrics. The improvements include a higher barrier height, breakdown strength, and charge-to-breakdown, and a lower leakage current and charge trapping rate than counterparts. It is found that this method can simultaneously improve both charge-to-breakdown (up to 20 C/cm2 ) and electric breakdown field (up to 17 MV/cm) |
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