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CdSe薄膜晶体管制备工艺的研究
引用本文:景玉梅,李志明,李菊生,叶如华.CdSe薄膜晶体管制备工艺的研究[J].液晶与显示,2000,15(1):35-39.
作者姓名:景玉梅  李志明  李菊生  叶如华
作者单位:中国科学院,长春光学精密机械与物理研究所,吉林,长春,130021
基金项目:国家科技部“863”计划(715-003—0070)资助项目
摘    要:对CdSe-TFT的制作工艺进行了探索,对TFT矩阵的关键材料-半导体层CdSe的性质进行了研究。利用XC-36型高阻仪研究了CdSe薄膜电阻率随蒸发速度的变化,用三探针法和Curve Tracer QT-2对TFT样管的基本性能进行了测试,得到载流子迁移率为170cm2/V.s,OFF态电流小于10^-10A,ON态电流为10^-4A。

关 键 词:薄膜晶体管  迁移率  硒化镉
文章编号:1007—2780(2000)01-0035-05
修稿时间:2000-01-21

Preparing Process of CdSe-TFT
JING Yu-met, LI Zhi-ming, LI Ju-sheng, YE Ru-hua.Preparing Process of CdSe-TFT[J].Chinese Journal of Liquid Crystals and Displays,2000,15(1):35-39.
Authors:JING Yu-met  LI Zhi-ming  LI Ju-sheng  YE Ru-hua
Abstract:The preparing process of CdSe-TFT was studied. Especially the growth of CdSe film, the semiconductor layer of the TFT was investigated. The resistivity of the film vs. The evporation rate was measured by a The resistivity of the film vs. The evporation rate was measured by a The resistivity of the film vs. The evporation rate was measured by a high impedance tester. The electric characters of the TFT were measured by using Curve Tracer QT-2. The mobility of carrier is 170cm /V-s; /OFF, respectively.
Keywords:CdSe  thin film transistor  mobility
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