The enhancement of electrical and optical properties of PEDOT:PSS using one-step dynamic etching for flexible application |
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| Affiliation: | 1. Plasma Coating Research Group, Korea Institute of Materials Science (KIMS), 797, Changwondaero, Changwon, Gyeongnam 641-831, Republic of Korea;2. Advanced Characterization & Analysis Research Group, Korea Institute of Materials Science (KIMS), 797, Changwondaero, Changwon, Gyeongnam 641-831, Republic of Korea;3. Department of Chemistry, Pukyong National University, 45, Yongso-ro, Nam-Gu, Busan 608-737, Republic of Korea;4. Department of Flexible and Printable Electronics, Chonbuk National University, 567, Baekje-Daero, Deokjin-Gu, Jeonju 561-756, Republic of Korea;1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands;2. Department of Physics, Chemistry and Biology (IFM), Linköping University, SE-58 183 Linköping, Sweden;3. Agfa-Gevaert NV, Septestraat 27, 2640 Mortsel, Belgium;1. Department of Materials Science and Engineering, Seoul National University, Seoul 151-744, South Korea;2. Department of Electrical Engineering and Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei 10617, Taiwan, ROC;1. Key Laboratory of Mesoscopic Chemistry of MOE, Jiangsu Provincial Lab for Nanotechnology, School of Chemistry and Chemical Engineering, Nanjing University, Nanjing 210093, China;2. School of Electronic Science and Engineering and Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials, Nanjing University, Nanjing 210093, China;1. Department of Chemistry, University of Warwick, Coventry CV4 7AL, UK;2. Department of Physics, University of Warwick, Coventry CV4 7AL, UK;3. Paintbox Limited, 36-44 Melchett Road, Birmingham B30 3HS, UK;1. Electrical and Computer Engineering Department, University of Denver, 2390 S York St, Denver, CO 80208, USA;2. Department of Electrical, Computer, and Energy Engineering, University of Colorado at Boulder, 425 UCB, Boulder, CO 80309, USA;3. Department of Physics and Astronomy, University of Denver, 2112 E Wesley Ave, Denver, CO 80208, USA;4. College of Technology, Purdue University, 5500 State Road 38E, West Lafayette, IN 47907, USA;5. National Renewable Energy Laboratory, 1617 Cole Blvd, Golden, CO 80401, USA;6. Department of Physics, University of Colorado at Boulder, 390 UCB, Boulder, CO 80309, USA;1. Department of Physics, Ningbo University, Ningbo, Zhejiang 315211, China;2. Institute of Photo-Electronic Thin Film Devices and Technology of Nankai University, Tianjin 300071, China |
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| Abstract: | The conductivity enhancement of poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) by dynamic etching process was investigated to introduce the outstanding and simplest method for soft electronics. Four different samples which were pristine PEDOT:PSS, PEDOT:PSS doped with 5 wt.% DMSO, PEDOT:PSS with dipping process, and PEDOT:PSS with dynamic etching process were prepared to compare the properties such as conductivity, morphology, relative atomic percentage, and topography. All samples were characterized by four point probe, current atomic force microscopy (C-AFM), X-ray photoelectron spectroscopy (XPS), and UV–visible spectroscopy. The conductivity of the sample with dynamic etching process showed the highest value as 1299 S/cm among four samples. We proved that the dynamic etching process is superior to remove PSS phase from PEDOT:PSS film, to flow strong current through entire surface of PEDOT:PSS, and to show the smoothest surface (RMS 2.28 nm). XPS analysis was conducted for accurate chemical and structural surface environments of four samples and the relative atomic percentage of PEDOT in the sample with dynamic etching was the highest as 29.5%. The device performance of the sample with the dynamic etching process was outstanding as 10.31 mA/cm2 of Jsc, 0.75 eV of Voc, 0.46 of FF, and 3.53% of PCE. All properties and the device performance for PEDOT:PSS film by dynamic etching process were the most excellent among the samples. |
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| Keywords: | Dynamic etching Conductivity enhancement PEDOT:PSS Flexible device |
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