| 电子回旋共振等离子体辅助溅射沉积锂磷氧氮薄膜 |
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| 引用本文： | 李驰麟,傅正文,舒兴胜,任兆杏.电子回旋共振等离子体辅助溅射沉积锂磷氧氮薄膜[J].无机材料学报,2006,21(1):193-198. |
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| 作者姓名： | 李驰麟 傅正文 舒兴胜 任兆杏 |
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| 作者单位： | 1.复旦大学化学系激光化学研究所, 上海市分子催化和功能材料重点实验室,上海 200433; 2. 中国科学院等离子体物理研究所, 合肥 230031) |
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| 摘 要： | 用电子回旋共振(ECR)等离子体辅助射频溅射沉积法制备快锂离子传导的锂磷氧氮(LiPON)薄膜. X射线光电子能谱、扫描电子显微镜、紫外可见吸收光谱等手段表征了在不同ECR功率辅助下沉积的薄膜. 结果显示, ECR等离子体对磁控溅射沉积薄膜的生长有明显的影响,能够提高N的插入量, 改变薄膜的组成与结构. 但是过高的ECR功率反而易破坏薄膜的结构, 不利于N的插入. 最佳的实验条件是在ECR 200W辅助下沉积的LiPON薄膜, 它的电导率约为8×10-6S/cm. 讨论了ECR对沉积LiPON薄膜的N插入机理.
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| 关 键 词： | 锂磷氧氮薄膜 溅射沉积 电子回旋共振 锂离子传导率 |
| 文章编号： | 1000-324X（2006）01-0193-06 |
| 收稿时间： | 11 12 2004 12:00AM |
| 修稿时间： | 2004-11-122005-02-28 |
Fabrication of Lithium Phosphorus Oxynitride (LiPON) Thin Films by r.f. Sputtering Coupled with Electron Cyclotron Resonance |
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| LI Chi-Lin,FU Zheng-Wen,SHU Xing-Sheng,REN Zhao-Xing.Fabrication of Lithium Phosphorus Oxynitride (LiPON) Thin Films by r.f. Sputtering Coupled with Electron Cyclotron Resonance[J].Journal of Inorganic Materials,2006,21(1):193-198. |
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| Authors: | LI Chi-Lin FU Zheng-Wen SHU Xing-Sheng REN Zhao-Xing |
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| Affiliation: | 1. Department of Chemistry and Laser Chemistry Institute, Shanghai Key Laboratory of Molecular Catalysts and Functional Materials,
Fudan University, Shanghai 200433, China; 2. Institute of Plasma Physics, Chinese Academy of Sciences, Hefei 230031, China |
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| Abstract: | Lithium Phosphorus Oxynitride (LiPON) thin films were successfully deposited by r.f. sputtering of Li3PO4 target coupled with electron cyclotron resonance (ECR) in N2 ambient. The effects of ECR powers on the composition, surface morphology, and structures of the as-deposited thin films were examined by X-ray photoelectron spectra (XPS), scanning electron microscope (SEM), and UV-Vis spectra measurements. The results indicated that ECR power had an influence on the growth of LiPON thin films. The optimization condition was found to be at ECR power of 200W to assist r.f. sputtering deposition of LiPON thin films, and Li ionic conductivity was obtained to be 8.0×10-6S/cm. Too high ECR power may be proven to destroy the structure of the thin film, and go against the effective insertion of N into Li3PO4. The mechanism of N inserted into Li3PO4 was discussed during r.f. sputtering process with ECR plasma assisting for the fabrication of LiPON film. |
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| Keywords: | lithium phosphorus oxynitride r f sputtering electron cyclotron resonance lithium ionic conductivity |
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