非平衡磁控溅射氮化钛薄膜及其性能研究

采用非平衡磁控溅射技术,在钛合金(Ti6Al4V)表面沉积氮化钛薄膜。通过改变氮气和氩气分压比(PN/PAr)和基体偏压,制备出不同结构、性能的氮化钛薄膜。采用X射线衍射技术、原子力显微镜、PS-168型电化学测量系统、CSEM球盘摩擦磨损实验机、HXD-1000 knoop显微硬度仪等研究了薄膜的结构、表面形貌、耐腐蚀性能与机械性能。结果表明,采用非平衡磁控溅射技术制备出了致密的氮化钛薄膜。当PN/PAr较小时,氮化钛薄膜中存在Ti2N时,Ti2N相可以有效提高薄膜的硬度和耐磨损性能;当PN/PAr增加到0.1时,薄膜硬度达到最大,耐磨损性能最优;随着PN/PAr的继续增大,氮化钛薄膜中主要存在TiN相,氮化钛薄膜的复合硬度和耐磨损性能降低。在钛合金(Ti6Al4V)表面沉积氮化钛薄膜可以显著提高其在Hanks类体液中的耐腐蚀性能。

Microstructures and Properties of Titanium Nitride Film Grown by Unbalanced Magnetron Sputtering

Titanium nitride films were grown by unbalanced magnetron sputtering at different N2 and Ar partial pressure ratios on Ti6Al4V alloy substrate.Its microstructures and mechanical properties were characterized with X-ray diffraction(XRD),atomic force microscopy(AFM) and the widely used conventional techniques.The results showed that the compact TiN films,grown at low N2 and Ar partial pressure ratios,significantly improved the mechanical properties of the alloy.For example,its micro-hardness,wear-resistance and corrosion-resistance were much higher than that of the control sample.Moreover,we found that the N2 and Ar partial pressure ratio strongly affected the microstructures of the TiN films.