| 硅圆片表面活化工艺参数优化研究 |
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| 引用本文： | 聂磊,阮传值,廖广兰,史铁林. 硅圆片表面活化工艺参数优化研究[J]. 功能材料, 2011, 42(3): 467-470 |
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| 作者姓名： | 聂磊 阮传值 廖广兰 史铁林 |
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| 作者单位： | 湖北工业大学湖北省现代制造质量工程重点实验室;华中科技大学机械科学与工程学院; |
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| 基金项目： | 国家自然科学基金资助项目(50805061,50975106); 国家重点基础研究发展计划(973计划)资助项目(2009CB724204) |
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| 摘 要： | 利用正交实验,对单晶硅表面活化工艺中重要参数对活化效果的影响进行了研究,并优化了工艺.实验针对RCA活化溶液处理工艺的特点,选择溶液配比、处理时间和温度3个重要因素为研究对象,以30%盐水为测试液,以接触角为指标,评估了这3个因素对活化效果的影响规律.对实验结果的分析表明,在此三因素中,活化温度与活化效果的关系最密切,...
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| 关 键 词： | 单晶硅 表面活化 直接键合 参数优化 |
Parameter optimization of surface activation on silicon wafer |
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| NIE Lei,RUAN Chuan-zhi,LIAO Guang-lan,SHI Tie-lin. Parameter optimization of surface activation on silicon wafer[J]. Journal of Functional Materials, 2011, 42(3): 467-470 |
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| Authors: | NIE Lei RUAN Chuan-zhi LIAO Guang-lan SHI Tie-lin |
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| Affiliation: | NIE Lei1,RUAN Chuan-zhi2,LIAO Guang-lan2,SHI Tie-lin2(1.Key Lab of Modern Manufacture Quality Engineering,Hubei University of Technology,Wuhan 430068,China,2.School of Mechanical Science and Engineering,Huazhong University of Science and Technology,Wuhan 430074,China) |
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| Abstract: | The effects of important process parameters in surface activation of monocrystal silicon wafer were investigated by orthogonal experiments and the activation process was optimized.The three parameters,volume ratio of activation solution,processing time and temperature,were selected as investigation objects.Based on the characters of surface activation process,the influences on surface activation of these parameters were estimated by the means of contact angle measurement experiments and 30% salt water was t... |
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| Keywords: | monocrystal silicon surface activation direct bonding parameter optimization |
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