| UO_2薄膜制备和光学常数及厚度测定 |
| |
| 引用本文： | 陈秋云,赖新春,白彬,张桂凯,罗丽珠,蒋春丽.UO_2薄膜制备和光学常数及厚度测定[J].原子能科学技术,2010,44(9):1126-1130. |
| |
| 作者姓名： | 陈秋云 赖新春 白彬 张桂凯 罗丽珠 蒋春丽 |
| |
| 作者单位： | 表面物理与化学国家重点实验室，四川 ;绵阳621907 |
| |
| 摘 要： | 利用磁控溅射法制备了UO2薄膜,通过扫描电子显微镜、X射线光电子能谱仪及X射线衍射仪,对薄膜进行了分析和表征。利用反射光谱法测得了薄膜在400～1200nm波长范围内的反射率。通过对反射图谱进行数据拟合,得出UO2薄膜在450～950nm波长范围内的折射率为2.1～2.65,消光系数约0.51,厚度为637nm。
|
| 关 键 词： | UO2" target="_blank">2')">UO2 薄膜 反射光谱 厚度 光学常数 |
Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy |
| |
| CHEN Qiu-yun,LAI Xin-chun,BAI Bin,ZHANG Gui-kai,LUO Li-zhu,JIANG Chun-li.Preparation and Measurement of Optical Constants and Thickness for Uranium Dioxide Thin Films by Reflectance Spectroscopy[J].Atomic Energy Science and Technology,2010,44(9):1126-1130. |
| |
| Authors: | CHEN Qiu-yun LAI Xin-chun BAI Bin ZHANG Gui-kai LUO Li-zhu JIANG Chun-li |
| |
| Affiliation: | National Key Laboratory for Surface Physics and Chemistry, P. O. Box 718-35, Mianyang 621907, China |
| |
| Abstract: | Uranium dioxide thin films were prepared by magnetron sputtering method. The films were analyzed and characterized by SEM, XPS and XRD. The reflectances of the films between 400 and 1 200 nm wavelength were measured by reflectance spectroscopy. By fitting the reflectance, the value of refractive index n and extinction coefficient k between 450 and 950 nm wavelength and the films thickness were obtained, the n is in the range of 2.1-2.65, k is nearly 0.51, and the film thickness is 637 nm. |
| |
| Keywords: | UO2 |
| 本文献已被 CNKI 万方数据 等数据库收录！ |
| 点击此处可从《原子能科学技术》浏览原始摘要信息 |
|
点击此处可从《原子能科学技术》下载全文 |
|
